Zobrazeno 1 - 10
of 24
pro vyhledávání: '"Tomoki Hirano"'
Autor:
Taichi Ito, Gentaro Mori, Yukari Oda, Tomoki Hirano, Hodaka Sasaki, Shinya Honma, Yoshitaka Furuya, Yasutomo Yajima
Publikováno v:
International Journal of Implant Dentistry, Vol 7, Iss 1, Pp 1-7 (2021)
Abstract Objective The mechanisms underlying the onset and progression of peri-implantitis are similar to those of periodontitis, and the causative bacteria are believed to similar. Previous studies support an association between peri-implantitis and
Externí odkaz:
https://doaj.org/article/8d8c074b712a4c2481e90ad2179a8ae2
Autor:
Yukari Oda, Tadashi Miura, Tomoki Hirano, Yoshitaka Furuya, Taichi Ito, Masao Yoshinari, Yasutomo Yajima
Publikováno v:
Scientific Reports, Vol 11, Iss 1, Pp 1-9 (2021)
Abstract Streptococci are associated with dental plaque formation as the early-colonizing bacteria that adhere to titanium (CpTi) and zirconia (TZP) implant abutment surfaces. Effective prevention of peri-implantitis may be possible by removing strep
Externí odkaz:
https://doaj.org/article/c5d99d85b70e43c0bf391672fa5b422f
Autor:
Hayato Iwamoto, Takashi Fukatani, Tomoki Hirano, Kenya Nishio, Yoshiya Hagimoto, Suguru Saito
Publikováno v:
Solid State Phenomena. 314:95-98
In this work, we characterized the wet chemical atomic layer etching of an InGaAs surface by using various surface analysis methods. For this etching process, H2O2 was used to create a self-limiting oxide layer. Oxide removal was studied for both HCl
Autor:
Masao Yoshinari, Tadashi Miura, Tomoki Hirano, Taichi Ito, Yukari Oda, Yasutomo Yajima, Yoshitaka Furuya
Publikováno v:
Scientific Reports, Vol 11, Iss 1, Pp 1-9 (2021)
Scientific Reports
Scientific Reports
Streptococci are associated with dental plaque formation as the early-colonizing bacteria that adhere to titanium (CpTi) and zirconia (TZP) implant abutment surfaces. Effective prevention of peri-implantitis may be possible by removing streptococci a
Autor:
Taichi Ito, Yukari Oda, Haruka Yasuoka, Marie Nakamura, Tomoki Hirano, Hodaka Sasaki, Yoshitaka Furuya, Yasutomo Yajima
Publikováno v:
The Bulletin of Tokyo Dental College. 63(1)
This report describes long-term implant treatment in a patient with chronic periodontitis. The patient was a 59-year-old man who attended our facility requesting a dental implant. An initial examination revealed generalized gingival inflammation and
Autor:
Yukari Oda, Tomoki Hirano, Yoshitaka Furuya, Gentaro Mori, Yasutomo Yajima, Hodaka Sasaki, Taichi Ito, Shinya Honma
Publikováno v:
International Journal of Implant Dentistry, Vol 7, Iss 1, Pp 1-7 (2021)
International Journal of Implant Dentistry
International Journal of Implant Dentistry
Objective The mechanisms underlying the onset and progression of peri-implantitis are similar to those of periodontitis, and the causative bacteria are believed to similar. Previous studies support an association between peri-implantitis and periodon
Autor:
Toshihiko Iijima, Tomoki Hirano, Shinya Homma, Ryotaro Nakano, Shota Hayashi, Noriko Iijima, Yasutomo Yajima
Publikováno v:
Dental materials journal. 40(4)
The objective of this study was to clarify the fatigue behavior of hollow yttria-stabilized tetragonal zirconia polycrystals (Y-TZP) specimens assuming its use for two-piece implants. The fatigue properties of a solid specimen (which simulated a one-
Autor:
Ryotaro Nakano, Yoshitaka Furuya, Shinya Homma, Takuya Takanashi, Tomoki Hirano, Yasutomo Yajima
Publikováno v:
Dental materials journal. 40(1)
The objective of this study was to investigate the effects of eccentric cyclic loading on implant components using the internal joint system with titanium and zirconia abutments. Abutments were made of either pure titanium (Ti group) or zirconia (TZP
Publikováno v:
Materials Science in Semiconductor Processing. 87:32-36
This study aims to elucidate the reaction sequence of enhanced etching of Ge surfaces in water with the assistance of reduced graphene oxide (rGO) sheets. For this purpose, we performed in situ atomic force microscopy observations. After the immersio
Publikováno v:
Carbon. 127:681-687
Catalyst-assisted chemical etching is an emerging technology for fabricating a variety of three-dimensional nanostructures on a semiconductor surface for future electronic and optical devices. In contrast to conventional wet etching using noble metal