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Autor:
Toshiki Iwai, Kazuhiko Mishima, Tohru Kawashima, Satoshi Iino, Nozomu Hayashi, Yasuyuki Unno, Tomokazu Taki, Takafumi Miyaharu, Ken Minoda, Shinichirou Hirai, Takamitsu Komaki, Kazuhiro Takahashi, Takahiro Matsumoto
Publikováno v:
Optical Microlithography XXXIII.
As the most aggressive features in advanced memory designs continue to shrink, so does the overlay budget. The number of layer stacks also creates unwanted topography, and the alignment robustness of lithography tools becomes much more important for
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7ec173f84b32f80054c1a79e00b0129a
https://doi.org/10.1117/12.2551980
https://doi.org/10.1117/12.2551980
