Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Tomohiro Iseki"'
Publikováno v:
ACS applied materialsinterfaces. 13(45)
The oxygen intake/release characteristics were systematically studied for Ca
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=pmid________::4620771ddbd0f2cb0c2a5ae90157149d
https://pubmed.ncbi.nlm.nih.gov/34736323
https://pubmed.ncbi.nlm.nih.gov/34736323
Autor:
Seiji Nagahara, Akihiro Oshima, Seiichi Tagawa, Kosuke Yoshihara, Michael A. Carcasi, Yukie Minekawa, Takehiko Naruoka, Hisashi Nakagawa, Tomohiro Iseki, Gosuke Shiraishi, Tomoki Nagai
Publikováno v:
SPIE Proceedings.
Extreme ultraviolet lithography (EUVL, λ = 13.5 nm) continues to be one of the most important candidates for future technology nodes. For the insertion of EUV lithography into device mass production, higher sensitivity of EUV resists is helpful for
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::83029e1558915e043e8c6fec62e36e9a
https://doi.org/10.1117/12.2258166
https://doi.org/10.1117/12.2258166
Autor:
Geert Vandenberghe, Tomohiro Iseki, Tomoki Nagai, Hisashi Nakagawa, Akihiro Oshima, Michael A. Carcasi, Yoshihiro Kondo, Seiichi Tagawa, Philippe Foubert, Danilo De Simone, Bernd Küchler, Yukie Minekawa, Serge Biesemans, Hans-Jürgen Stock, Takehiko Naruoka, Hideo Nakashima, Yasin Ekinci, Yuya Kamei, Elizabeth Buitrago, Seiji Nagahara, Masafumi Hori, Ryo Shimada, Takahiro Shiozawa, Gosuke Shiraishi, Masaru Tomono, Michaela Vockenhuber, Satoshi Dei, Kosuke Yoshihara, Kathleen Nafus
Publikováno v:
SPIE Proceedings.
A new type of Photosensitized Chemically Amplified Resist (PSCAR) **: “PSCAR 2.0,” is introduced in this paper. PSCAR 2.0 is composed of a protected polymer, a “photo acid generator which can be photosensitized” (PS-PAG), a “photo decomposa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4aa891c97aae2f8f80b1932ad46b2948
https://doi.org/10.1117/12.2258217
https://doi.org/10.1117/12.2258217
Autor:
Masaru Aniya, Tomohiro Iseki
Publikováno v:
Journal of Non-Crystalline Solids. :400-403
It is known that superionic conductors such as silver chalcogenides exhibit an intermediate behavior between solids and liquids. This observation has lead to the concept of sublattice melting and to a model for superionic conductors such as a ‘crys
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::552e95f73ae858e55e9112d3f2f275ce
https://doi.org/10.1016/s0022-3093(02)01762-3
https://doi.org/10.1016/s0022-3093(02)01762-3
Publikováno v:
Journal of Non-Crystalline Solids. :579-581
The interpenetrating two-fluid model proposed previously to describe the properties of superionic melts has been applied to study the composition dependence of the diffusion coefficient in liquid Ag–Se system. The model predicts the existence of a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9cf9733cfaa55c945acc0cdbc4406c40
https://doi.org/10.1016/j.jnoncrysol.2004.03.046
https://doi.org/10.1016/j.jnoncrysol.2004.03.046
Autor:
Koji Takayanagi, Ryouichi Uemura, Tomohiro Iseki, Kosuke Yoshihara, Yuichi Yoshida, Hiroshi Marumoto, Keiichi Tanaka
Publikováno v:
SPIE Proceedings.
Defect reduction has become one of the most important technical challenges in device mass-production. Knowing that resist processing on a clean track strongly impacts defect formation in many cases, we have been trying to improve the track process to
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7390e4c5a58adf9cb41b2841a60965ad
https://doi.org/10.1117/12.915813
https://doi.org/10.1117/12.915813
Autor:
Akihiro Fujimoto, Katsunori Ichino, Kosuke Yoshihara, Taro Yamamoto, Nobuhiro Ogata, Tomohiro Iseki, Keiji Tanouchi
Publikováno v:
Advances in Resist Materials and Processing Technology XXV.
On the device manufacturing, the film edge control around the wafer edge has been critical at the point of edge control of deposited film. So far, the film edge control is operated by the wafer edge exposure system and/or the edge beam remover. The i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9ca2d2db96a46150474b5b12a5b1c545
https://doi.org/10.1117/12.772158
https://doi.org/10.1117/12.772158