Zobrazeno 1 - 10
of 51
pro vyhledávání: '"Tomoharu Fujiwara"'
Autor:
Ryoh Funatsu, Hiroto Terasaki, Hideki Shiihara, Sumihiro Kawano, Mariko Hirokawa, Yasushi Tanabe, Tomoharu Fujiwara, Yoshinori Mitamura, Taiji Sakamoto, Shozo Sonoda
Publikováno v:
Scientific Reports, Vol 11, Iss 1, Pp 1-9 (2021)
Abstract The purpose of this study was to determine the number and location of vortex vein ampullae (VVA) in normal eyes. This was an observational retrospective study. Montage images of one on-axis and two off-axis ultra-widefield images of 74 healt
Externí odkaz:
https://doaj.org/article/60d209fd54aa465fb356cbaa4ca90aaf
Autor:
Hiroto Terasaki, Sumihiro Kawano, Ryoh Funatsu, Taiji Sakamoto, Hirokawa Mariko, Hideki Shiihara, Shozo Sonoda, Tomoharu Fujiwara, Yoshinori Mitamura, Tanabe Yasushi
Publikováno v:
Scientific Reports
Scientific Reports, Vol 11, Iss 1, Pp 1-9 (2021)
Scientific Reports, Vol 11, Iss 1, Pp 1-9 (2021)
The purpose of this study was to determine the number and location of vortex vein ampullae (VVA) in normal eyes. This was an observational retrospective study. Montage images of one on-axis and two off-axis ultra-widefield images of 74 healthy eyes w
Autor:
Katsutoshi Kobayashi, Tomoharu Fujiwara, Toshikatsu Tobana, Katsuyoshi Kodera, Hironobu Sato, Shinya Minegishi, Naoko Kihara, Yoshiaki Kawamonzen, Hideki Kanai, Yusuke Kasahara, Yuriko Seino, Tsukasa Azuma, Ken Miyagi, Noriyuki Hirayanagi
Publikováno v:
Microelectronic Engineering. 134:27-32
Display Omitted We report a novel simple sub-15nm L/S patterning process using PS-b-PMMA for DSA lithography.The HP 15nm L/S DSA patterning was demonstrated on 300mm wafer.3D BCP internal defect could be minimized by an optimization of material and a
Autor:
Noriyuki Hirayanagi, Yusuke Kasahara, Yoshiaki Kawamonzen, Naoko Kihara, Toshikatsu Tobana, Tomoharu Fujiwara, Tsukasa Azuma, Hironobu Sato, Shinya Minegishi, Ken Miyagi, Hideki Kanai, Katsutoshi Kobayashi, Katsuyoshi Kodera
Publikováno v:
Journal of Photopolymer Science and Technology. 27:31-36
Publikováno v:
ECS Transactions. 52:199-211
OPE matching and CD-Uniformity control have become inevitable steps for most of high volume manufacturing(HVM) of a state-of-the-art devices. OPE matching is a step to match CDs of various patterns from different scanners or steppers. CD-Uniformity c
Autor:
Takeo Ishibashi, Jianhai Jiang, Tetsuro Hanna, Yoko Takebe, Tomoharu Fujiwara, Teruhiko Kumada, Shinya Wakamizu, Takafumi Niwa, Osamu Yokokoji, Takuya Hagiwara, Mamoru Terai, Hideharu Kyouda
Publikováno v:
Journal of Photopolymer Science and Technology. 21:665-672
In this study, we focus on the controllability of a wafer bevel from adhesion and hydrophobicity viewpoints in order to solve the problems of film peeling and microdroplet formation around wafer bevels, which can result in pattern defects and degradi
Autor:
Shinya Minegishi, Teruaki Hayakawa, Yusuke Kasahara, Toshikatsu Tobana, Noriyuki Hirayanagi, Naoko Kihara, Katsutoshi Kobayashi, Hironobu Sato, Yoshiaki Kawamonzen, Tsukasa Azuma, Hideki Kanai, Tomoharu Fujiwara, Katsuyoshi Kodera, Ken Miyagi, Yuriko Seino
Publikováno v:
MRS Proceedings. 1750
This paper introduces a fabrication method to achieve sub-15 nm line-and-space (L/S) patterns by combining grapho- and chemo-epitaxy using poly(styrene-block-methyl methacrylate) copolymer (PS-b-PMMA). The fabrication method is simple, since it elimi
Autor:
Yusuke Kasahara, Yuriko Seino, Naoko Kihara, Katsuyoshi Kodera, Yoshiaki Kawamonzen, Hironobu Sato, Hideki Kanai, Tomoharu Fujiwara, Katsutoshi Kobayashi, Shinya Minegishi, Ken Miyagi, Toshikatsu Tobana, Tsukasa Azuma, Noriyuki Hirayanagi
Publikováno v:
MRS Proceedings. 1750
A specific type of buried defect in lamellar phase diblock copolymer was studied by experiments and simulations using self-consistent field theory (SCFT). The defects had 3-dimensional structures and created hexagonally arranged holes. They existed n
Autor:
Saori Fukui, Aoyama Takashi, Kazuaki Suzuki, Toshimasa Shimoda, Takaharu Miura, Tomoharu Fujiwara, Hiroshi Hirose, Junji Ikeda, Futoshi Mori, Hiroyasu Shimizu, Hidekazu Takekoshi, Shigeru Takemoto, Norihiro Katakura, Takehisa Yahiro, Toru Tanida, Kenji Morita, Yoshiaki Kohama, Suzuki Motoko, Atsushi Yamada, Takaaki Umemoto, Yukiharu Ohkubo, Teruaki Okino, Kaoru Ohmori, Takeshi Yoshioka, Yoichi Watanabe, Yukio Kakizaki, Shintaro Kawata, Shohei Suzuki, Noriyuki Hirayanagi, Shinichi Kojima, Hajime Yamamoto, Jin Udagawa, Kazunari Hada
Publikováno v:
J. Vac. Sci. Technol. B. 22(No. 6):2885-2890
Electron projection lithography (EPL) is a realistic technology for the 65nm node and below, as a complementary technology of optical lithography especially for contacts and gate layers because of its high resolution and large process margin. Nikon h
Autor:
Takehisa Yahiro, Atsushi Yamada, Shinichi Kojima, K. Okamoto, Tomoharu Fujiwara, Shin-ichi Takahashi, Muneki Hamashima, Takeshi Yamaguchi, Junji Ikeda, Hiroyasu Shimizu, Takaaki Umemoto
Publikováno v:
Microelectronic Engineering. :122-129
Nikon in collaboration with IBM has been developing electron projection lithography (EPL) as a promising candidate for 65 nm node technologies. In this paper, the latest performance of electron optics for a 65 nm R&D tool will be described with empha