Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Tomoe Otsuka"'
Autor:
Takashi Watari, Nathan Houchens, Yuji Nishizaki, Koshi Kataoka, Tomoe Otsuka, Yasuhisa Nakano, Kota Sakaguchi, Yoshihiko Shiraishi, Kohta Katayama, Hitomi Kataoka, Yasuharu Tokuda
Publikováno v:
Scientific Reports, Vol 13, Iss 1, Pp 1-10 (2023)
Abstract Empathy is essential for physicians to provide patient-centered care. Nevertheless, the degree to which empathy varies among medical residents based on their desired future specialty remains undetermined. This nationwide cross-sectional stud
Externí odkaz:
https://doaj.org/article/6f4ae1719d6145b882a40021e1314657
Autor:
Takashi Watari, Nathan Houchens, Tomoe Otsuka, Takeshi Endo, Seiji Odagawa, Yasuhisa Nakano, Hitomi Kataoka, Mamoru Miwa, Daisaku Yamasaki, Yasuharu Tokuda, Yoshihiko Shiraishi, Kota Sakaguchi
Publikováno v:
Postgraduate Medical Journal; Dec2023, Vol. 99 Issue 1178, p1258-1265, 8p
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2022.
Publikováno v:
Japanese Journal of Applied Physics. 61:086508
Metal oxide nanocluster resists are a promising candidate for enabling the high-volume production of semiconductor devices with high-numerical-aperture extreme ultraviolet exposure tools. In this study, the sensitization mechanism of metal oxide nano
Publikováno v:
Japanese Journal of Applied Physics. 61:056503
Understanding the interaction of resist materials with the underlayers is important for the development of highly resolving resist materials. In this study, the effect of the surface free energy of the organic underlayer on the dissolution kinetics o
Publikováno v:
Japanese Journal of Applied Physics. 61:036503
Metal oxide nanocluster resists have recently attracted considerable attention for use in extreme ultraviolet lithography. To obtain sophisticated guidelines for material design, it is necessary to understand well the radiation-induced chemical react