Zobrazeno 1 - 1
of 1
pro vyhledávání: '"Tom Vanderwayer"'
Autor:
Ahjin Jo, Sebastian W. Schmidt, Ju Suk Lee, Ardavan Zandiatashbar, Sang-il Park, Tom Vanderwayer, Bernd Irmer, Tae-Gon Kim, Sang-Joon Cho, Byoung-Woon Ahn, Soon-Wook Kim
Publikováno v:
2017 28th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
We demonstrated fully automated in-line atomic force microscopy (AFM) for local height variation monitoring solution. Two use cases, which are local variation of SADP Fin height and oxide recess height in Fin reveal process and that of Cu nail protru
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::48df4e85940fd8223e3ae5f6aed928a4
https://doi.org/10.1109/asmc.2017.7969242
https://doi.org/10.1109/asmc.2017.7969242
