Zobrazeno 1 - 1
of 1
pro vyhledávání: '"Tomáš Ibehej"'
Publikováno v:
Advances in Materials Science and Engineering, Vol 2017 (2017)
We present a computational study of processes taking place in a sheath region formed near a negatively biased uneven substrate during ionized plasma vapour deposition. The sputtered metal atoms are ionized on their way to substrate and they are accel
Externí odkaz:
https://doaj.org/article/599b2a1450c5403598229e03de982a80
