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Autor:
Sweetu Patel, Sathees Kannan Selvaraj, Bin Yang, Arghya K. Bishal, Cortino Sukotjo, Christos G. Takoudis, Tolou Shukohfar, Su Huang, Arman Butt, Bela Joshi
Publikováno v:
Critical reviews in biomedical engineering. 43(4)
Atomic layer deposition (ALD) is a technique increasingly used in nanotechnology and ultrathin film deposition; it is ideal for films in the nanometer and Angstrom length scales. ALD can effectively be used to modify the surface chemistry and functio
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4f9ffbe690e74bd2b674598ce94e3d2d
https://pubmed.ncbi.nlm.nih.gov/27480459
https://pubmed.ncbi.nlm.nih.gov/27480459
