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pro vyhledávání: '"Tohru Wataya"'
Autor:
Hiroshi Tokumoto, Kashimura Kenta, Tatsuo Kawakami, Tetsuo Shimizu, Tohru Wataya, Shun'ichiro Shimbori, Yokosuka Shuntaro, Yuya Shirayama, Yasuhisa Naitoh
Publikováno v:
Journal of the Vacuum Society of Japan. 53:234-237
We have successufully developed a localized plasma etching system for failure analyses in semiconductor devices. The plasma was excited by a capacitively coupled plasma technique using a quartz capillary tube and the system can be operated by both me
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4a5da8761f332a8fd51b01568b37d023
https://doi.org/10.3131/jvsj2.53.234
https://doi.org/10.3131/jvsj2.53.234
