Zobrazeno 1 - 10
of 35
pro vyhledávání: '"Tohru Satake"'
Autor:
Kenji Watanabe, Masahiro Hatakeyama, Katsunori Ichiki, Tohru Satake, Takao Kato, Kazutoshi Nagai
Publikováno v:
Applied Surface Science. :603-606
We developed a large-hole anode-type fast atom beam (LA-FAB) source and evaluated its discharge characteristics. To estimate the LA-FAB source performance, we measured the effect of the magnetic field intensity on the discharge current. The results s
Publikováno v:
Applied Surface Science. :287-290
FAB-SIMS is a surface analysis method that uses bombardment by a fast atom beam as the probe instead of a conventional ion beam. Because FAB carries no electric charge, this method is particularly effective for insulator analysis. An apparatus for FA
Publikováno v:
Journal of Applied Physics. 69:6417-6421
Yb metal deposited by a molecular‐beam epitaxy technique was grown as an fcc single crystal on a NaCl substrate with an epitaxial relationship in which the Yb (100) [100] is parallel to the NaCl (100) [100]. An epitaxial Sm/Yb superlattice was succ
Publikováno v:
Thin Solid Films. 192:135-140
Europium thin films were grown on various substrates by the molecular-beam epitaxy technique. X-ray diffraction and in situ reflection high-energy electron diffraction observations revealed that the europium thin films possessed a textured structure
Publikováno v:
Journal of Applied Physics. 68:3246-3249
A bcc‐Eu metal layer having a double‐domain structure was grown by the molecular‐beam epitaxy (MBE) technique on a cleaved NaCl (100) surface with the epitaxial relationship that Eu (110) [100] or [110] is parallel to NaCl (100) [100]. An Eu/Yb
Autor:
Tohru Satake, Nobuharu Noji, Takeshi Murakami, Manabu Tsujimura, Ichirota Nagahama, Yuichiro Yamazaki, Atsushi Onishi
Publikováno v:
SPIE Proceedings.
Autor:
Ichirota Nagahama, Takeshi Murakami, Yuichiro Yamazaki, Nobuharu Noji, Manabu Tsujimura, Onishi Atsushi, Tohru Satake
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XVIII.
Optical inspection systems and/or electron beam inspection systems are quite useful tools for the yield management in the semiconductor process. However, they have some issues of difficulties for the application to the yield management after 100nm-te
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XVIII.
The production prototype of an electron beam inspection system based on projection electron microscopy (EBI-PEM) has been developed. Inspection performances of the EBI-PEM were evaluated using the programmed defect standard wafer delivered by SELETE.
Publikováno v:
Physics Letters A. 157:178-180
Unique magnetic-frozen phenomena, characterized by three cusps in the temperature dependent magnetization curve, were observed for zero-field cooled Eu/Mn superlattices under low magnetic fields. With increasing magnetic field, the freezing temperatu