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pro vyhledávání: '"Tohoru Ogawa"'
Autor:
Tohoru Ogawa, Keisuke Nakazawa, Takeshi Ohfuji, Hiroshi Ohtsuka, Makoto Takahashi, Shinji Kishimura, Masaya Uematsu, Masaru Sasago
Publikováno v:
SPIE Proceedings.
In ArF excimer laser lithography, the bottom antireflective coating (BARC) technique is essential in inhibiting the effect of interference and reflective notching. We investigated the antireflective effect of commercially available organic BARCs, tha
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c0e7fa18ea56e84c9e2ffcd57e37eb4b
https://doi.org/10.1117/12.310760
https://doi.org/10.1117/12.310760
