Zobrazeno 1 - 10
of 60
pro vyhledávání: '"Todd Bailey"'
Autor:
Piotr Tompalski, Nicholas C. Coops, Peter L. Marshall, Joanne C. White, Michael A. Wulder, Todd Bailey
Publikováno v:
Remote Sensing, Vol 10, Iss 9, p 1432 (2018)
n/a
Externí odkaz:
https://doaj.org/article/af05660719b4439099a502dec18afc76
Autor:
Piotr Tompalski, Nicholas C. Coops, Peter L. Marshall, Joanne C. White, Michael A. Wulder, Todd Bailey
Publikováno v:
Remote Sensing, Vol 10, Iss 2, p 347 (2018)
The increasing availability of highly detailed three-dimensional remotely-sensed data depicting forests, including airborne laser scanning (ALS) and digital aerial photogrammetric (DAP) approaches, provides a means for improving stand dynamics inform
Externí odkaz:
https://doaj.org/article/57b117fb0f3946eda0099a57cf90c60c
Autor:
Christopher Mulverhill, Nicholas C. Coops, Joanne C. White, Piotr Tompalski, Peter L. Marshall, Todd Bailey
Publikováno v:
Forests, Vol 9, Iss 2, p 95 (2018)
Stem size distribution (SSD), which describes tree frequencies in diameter classes within an area, has a variety of direct and indirect applications that are critical for forest management. In this study, we evaluated which structural characteristics
Externí odkaz:
https://doaj.org/article/cbd844436bd043a2876ac6077b37fe92
Autor:
Todd Bailey, Wei-Long Wang, Weijie Lu, Jed H. Rankin, Yee Mei Foong, Gek Soon Chua, Paul Ackmann
Publikováno v:
Photomask Technology 2019.
With 193nm optical lithography being extended to 12nm design rules and beyond, quality and performance requirements for photomasks are becoming increasingly challenged to support the increased pattern complexity. Additionally, interactions between ma
Autor:
Alisher R, Dadabayev, Brent, Coy, Todd, Bailey, Andrew J, Grzesiak, Livia, Franchina, Mark S, Hausman, Sarah, Krein
Publikováno v:
Federal practitioner : for the health care professionals of the VA, DoD, and PHS. 35(2)
A novel interdisciplinary team approach within a primary care setting may be a promising model for delivering effective comprehensive treatment options for patients with chronic pain.
Autor:
Jed H. Rankin, Larry Zhuang, Ingo Bork, Fan Jiang, Alexander Wei, Alexander Tritchkov, Todd Bailey, Yuyang Sun, Xima Zhang, Vivian Wei Guo, James Word, Srividya Jayaram
Publikováno v:
Photomask Technology 2018.
As the EUV lithography is extending beyond 7nm technology, design to mask strategy becomes more complex. New challenges including advanced OPC and ILT in mask optimization, curvilinear masks, shrinking Mask Rule Checking (MRC), Sub-Resolution Assist
Publikováno v:
Extreme Ultraviolet (EUV) Lithography IX.
Edge position variation in EUV patterns is significantly affected by stochastic phenomena that occur during the EUV exposure and the chemical processes in photoresist. Hence, it is important to understand and quantify the contribution of each of the
Autor:
Yuyang Sun, Larry Zhuang, Srividya Jayaram, Todd Bailey, Fan Jiang, Scott M. Mansfield, Vivian Wei Guo, Alexander Tritchkov, Xima Zhang
Publikováno v:
Extreme Ultraviolet (EUV) Lithography IX.
The next generation beyond 7nm node potentially requires the implementation of Sub-Resolution Assist Features (SRAF) with EUV lithography. This paper aims at providing a clear SRAF strategy for the next generation beyond 7nm node designs through a se
Autor:
Michael A. Wulder, Todd Bailey, Joanne C. White, Piotr Tompalski, Nicholas C. Coops, Peter L. Marshall
Publikováno v:
Remote Sensing, Vol 10, Iss 2, p 347 (2018)
Remote Sensing
Volume 10
Issue 2
Pages: 347
Remote Sensing
Volume 10
Issue 2
Pages: 347
The increasing availability of highly detailed three-dimensional remotely-sensed data depicting forests, including airborne laser scanning (ALS) and digital aerial photogrammetric (DAP) approaches, provides a means for improving stand dynamics inform
Publikováno v:
SPIE Proceedings.
The effects of thermal fluctuations in graphoepitaxy DSA are studied using simulations based on the self-consistent field theory (SCFT) model. The known method of using an external potential field to displace or deform the DSA cylinder is employed to