Towards understanding intrinsic degradation and breakdown mechanisms in SiOCH low-k dielectrics.

Autor: Wu, C., Li, Y., Ciofi, I., Kauerauf, Th., Bömmels, J., De Wolf, I., Toőkei, Zs., Croes, K.

Publikováno v: Journal of Applied Physics; 2015, Vol. 117 Issue 6, p064101-1-064101-8, 8p, 1 Diagram, 2 Charts, 12 Graphs