Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Tjarko Adriaan Rudolf Van Empel"'
Autor:
Mark van de Kerkhof, Vadim Yevgenyevich Banine, Tjarko Adriaan Rudolf Van Empel, Michael Lercel, Christophe Smeets, Amo Chen
Publikováno v:
Photomask Technology 2019.
EUV pellicles have been enabled to provide customers with defect protection for EUV reticles. However, due to the absorption that is much higher than for DUV pellicles, using the pellicle has certain disadvantages. Most significant is the reduction i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f596cb397c5316162195a573ef4feffb
https://doi.org/10.1117/12.2535396
https://doi.org/10.1117/12.2535396
Autor:
Christian Cloin, Michael Lercel, Christophe Smeets, Mark van de Kerkhof, Tjarko Adriaan Rudolf Van Empel, Andrei Mikhailovich Yakunin, Andrey Nikipelov, Vadim Banine, Ferdi van de Wetering
Publikováno v:
Extreme Ultraviolet (EUV) Lithography X.
With the introduction of the NXE:3400B scanner, ASML has brought EUV to High-Volume Manufacturing (HVM). In this context, ASML is pursuing a dual-path approach towards zero reticle defectivity: EUV-compatible pellicle or zero particles towards reticl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e60a537528793ec771527c52ed04e8a7
https://doi.org/10.1117/12.2514874
https://doi.org/10.1117/12.2514874