Výsledky vyhledávání - "Tito F. Bellunato"

Lowering the photoresist swing effect to increase the lithographic critical dimension uniformity: one step ahead in perfecting the dual damascene module

Autor: Valentina Dall'Asta, Emma Litterio, Nicoletta Corneo, Bertrand Le-Gratiet, Tito F. Bellunato

Publikováno v: Advances in Patterning Materials and Processes XXXIX.

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::acaa772467db1c1d0992e19f9c41d994
https://doi.org/10.1117/12.2614005

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