Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Tito Chowdhury"'
Publikováno v:
SPIE Proceedings.
The BCT solution is an automatic correction for systematic offset built into the PCS product based on calibration from 2-5 wafers. This paper explores the validity of a predictive model for process control for use by manufacturers of semiconductor de
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::238d192b39f931e2de333516ccc27558
https://doi.org/10.1117/12.536454
https://doi.org/10.1117/12.536454
Autor:
Hean-Cheal Lee, Jinhan Choi, Hanna Bamnolker, Chan-Lon Yang, Roni Khen, Yan Du, Shashank C. Deshmukh, Meihua Shen, Tito Chowdhury
Publikováno v:
Advances in Resist Technology and Processing XX.
193nm lithography has become increasingly important as the critical dimensions of semiconductor devices continue to scale down towards sub 0.10um dimension. From dry etching perspective, however, 193nm resist brings new challenges due to its poorer p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::90975c3a7996acfd884fd8043d370490
https://doi.org/10.1117/12.485151
https://doi.org/10.1117/12.485151
Publikováno v:
SPIE Proceedings.
Studies on photomask Cr and MoSi etch processes were carried out and etch kinetics and modeling were performed. The photomasks were etched using an AMAT Centura II DPS and compared with a Unaxis VLE 770 ICP etcher. Mask metrology to support theoretic
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8b09c52df11d1c4730147b7541305bb8
https://doi.org/10.1117/12.483671
https://doi.org/10.1117/12.483671