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of 97
pro vyhledávání: '"Tisdale, WA"'
Publikováno v:
Journal of Physical Chemistry C, vol 124, iss 22
The Journal of Physical Chemistry C, vol 124, iss 22
The Journal of Physical Chemistry C, vol 124, iss 22
Atomically thin semiconductors such as monolayer MoS2 and WS2 exhibit nonlinear exciton-exciton annihilation at notably low excitation densities (below ∼10 excitons/μm2 in exfoliated MoS2). Here, we show that the density threshold at which annihil
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::b6ffcc9144dd8e79da9006a28b0bfdb8
https://escholarship.org/uc/item/1dp2g4fp
https://escholarship.org/uc/item/1dp2g4fp
Autor:
Tisdale Wa
Publikováno v:
New England Journal of Medicine. 284:1273-1274
Akademický článek
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Akademický článek
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Autor:
Mao N; Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States.; Department of Chemical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States., Huang S; State Key Laboratory of Surface Physics, Key Laboratory of Micro and Nano-Photonic Structures (Ministry of Education), Shanghai Key Laboratory of Metasurfaces for Light Manipulation, and Department of Physics, Fudan University, Shanghai 200433, China.; Shanghai Frontiers Science Research Base of Intelligent Optoelectronics and Perception, Institute of Optoelectronics, Fudan University, Shanghai 200433, China., Pimenta Martins LG; Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States.; Department of Physics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States., Yan H; State Key Laboratory of Surface Physics, Key Laboratory of Micro and Nano-Photonic Structures (Ministry of Education), Shanghai Key Laboratory of Metasurfaces for Light Manipulation, and Department of Physics, Fudan University, Shanghai 200433, China.; Shanghai Frontiers Science Research Base of Intelligent Optoelectronics and Perception, Institute of Optoelectronics, Fudan University, Shanghai 200433, China., Ling X; Department of Chemistry, Boston University, Boston, Massachusetts 02215, United States.; Division of Materials Science and Engineering, Boston University, Boston, Massachusetts 02215, United States., Liang L; Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, United States., Kong J; Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States., Tisdale WA; Department of Chemical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States.
Publikováno v:
Nano letters [Nano Lett] 2024 Oct 09; Vol. 24 (40), pp. 12582-12589. Date of Electronic Publication: 2024 Sep 30.
Autor:
Tisdale WA; Department of Chemical Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA. tisdale@mit.edu.
Publikováno v:
Nature materials [Nat Mater] 2024 Sep; Vol. 23 (9), pp. 1155-1156.
Autor:
Price EK; Department of Chemical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States., Tisdale WA; Department of Chemical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States.
Publikováno v:
Nano letters [Nano Lett] 2024 Aug 14; Vol. 24 (32), pp. 9983-9989. Date of Electronic Publication: 2024 Jul 30.
Autor:
Sekh TV; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, 8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland., Cherniukh I; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, 8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland., Kobiyama E; IBM Research Europe-Zürich, Rüschlikon CH-8803, Switzerland., Sheehan TJ; Department of Chemical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States., Manoli A; Experimental Condensed Matter Physics Laboratory, Department of Physics, University of Cyprus, 1678 Nicosia, Cyprus., Zhu C; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, 8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland., Athanasiou M; Experimental Condensed Matter Physics Laboratory, Department of Physics, University of Cyprus, 1678 Nicosia, Cyprus., Sergides M; Laboratory of Ultrafast Science, Department of Physics, University of Cyprus, Nicosia 1678, Cyprus., Ortikova O; Electron Microscopy Center, Empa-Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland., Rossell MD; Electron Microscopy Center, Empa-Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland., Bertolotti F; Department of Science and High Technology and To.Sca.Lab, University of Insubria, via Valleggio 11, 22100 Como, Italy., Guagliardi A; Istituto di Cristallografia and To.Sca.Lab, Consiglio Nazionale delle Ricerche, via Valleggio 11, 22100 Como, Italy., Masciocchi N; Department of Science and High Technology and To.Sca.Lab, University of Insubria, via Valleggio 11, 22100 Como, Italy., Erni R; Electron Microscopy Center, Empa-Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf, Switzerland., Othonos A; Laboratory of Ultrafast Science, Department of Physics, University of Cyprus, Nicosia 1678, Cyprus., Itskos G; Experimental Condensed Matter Physics Laboratory, Department of Physics, University of Cyprus, 1678 Nicosia, Cyprus., Tisdale WA; Department of Chemical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States., Stöferle T; IBM Research Europe-Zürich, Rüschlikon CH-8803, Switzerland., Rainò G; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, 8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland., Bodnarchuk MI; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, 8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland., Kovalenko MV; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, 8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa-Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.
Publikováno v:
ACS nano [ACS Nano] 2024 Mar 19; Vol. 18 (11), pp. 8423-8436. Date of Electronic Publication: 2024 Mar 06.
Autor:
Shcherbakov-Wu W; Department of Chemical Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA.; Department of Chemistry, Massachusetts Institute of Technology, Cambridge, MA, USA., Saris S; Department of Chemical Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA.; Laboratory of Nanochemistry for Energy (LNCE), Institute of Chemical Sciences and Engineering (ISIC), École Polytechnique Fédérale de Lausanne, CH-1950 Sion, Switzerland., Sheehan TJ; Department of Chemical Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA., Wong NN; Department of Chemical Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA., Powers ER; Department of Chemical Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA., Krieg F; Department of Chemistry and Applied Bioscience, ETH Zürich, Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics and Laboratory for Transport at Nanoscale Interfaces, Empa - Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, Switzerland., Kovalenko MV; Department of Chemistry and Applied Bioscience, ETH Zürich, Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics and Laboratory for Transport at Nanoscale Interfaces, Empa - Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, Switzerland., Willard AP; Department of Chemistry, Massachusetts Institute of Technology, Cambridge, MA, USA., Tisdale WA; Department of Chemical Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA.
Publikováno v:
Science advances [Sci Adv] 2024 Feb 23; Vol. 10 (8), pp. eadj2630. Date of Electronic Publication: 2024 Feb 21.
Autor:
Posmyk K; Department of Experimental Physics, Faculty of Fundamental Problems of Technology, Wroclaw University of Science and Technology, Wroclaw 50-370, Poland.; Laboratoire National des Champs Magnétiques Intenses, EMFL, CNRS UPR 3228, Université Grenoble Alpes, Université Toulouse, Université Toulouse 3, INSA-T, 38042 Grenoble, Toulouse 31400, France., Zawadzka N; Institute of Experimental Physics, Faculty of Physics, University of Warsaw, Warsaw 02-093, Poland., Łucja Kipczak; Institute of Experimental Physics, Faculty of Physics, University of Warsaw, Warsaw 02-093, Poland., Dyksik M; Department of Experimental Physics, Faculty of Fundamental Problems of Technology, Wroclaw University of Science and Technology, Wroclaw 50-370, Poland., Surrente A; Department of Experimental Physics, Faculty of Fundamental Problems of Technology, Wroclaw University of Science and Technology, Wroclaw 50-370, Poland., Maude DK; Laboratoire National des Champs Magnétiques Intenses, EMFL, CNRS UPR 3228, Université Grenoble Alpes, Université Toulouse, Université Toulouse 3, INSA-T, 38042 Grenoble, Toulouse 31400, France., Kazimierczuk T; Institute of Experimental Physics, Faculty of Physics, University of Warsaw, Warsaw 02-093, Poland., Babiński A; Institute of Experimental Physics, Faculty of Physics, University of Warsaw, Warsaw 02-093, Poland., Molas MR; Institute of Experimental Physics, Faculty of Physics, University of Warsaw, Warsaw 02-093, Poland., Bumrungsan W; Department of Materials Science and Engineering, School of Molecular Science and Engineering, Vidyasirimedhi Institute of Science and Technology (VISTEC), Rayong 21210, Thailand., Chooseng C; Department of Chemical and Biomolecular Engineering, School of Energy Science and Engineering, Vidyasirimedhi Institute of Science and Technology (VISTEC), Rayong 21210, Thailand., Paritmongkol W; Department of Materials Science and Engineering, School of Molecular Science and Engineering, Vidyasirimedhi Institute of Science and Technology (VISTEC), Rayong 21210, Thailand.; Department of Chemical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States.; Department of Chemistry, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States., Tisdale WA; Department of Chemical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States., Baranowski M; Department of Experimental Physics, Faculty of Fundamental Problems of Technology, Wroclaw University of Science and Technology, Wroclaw 50-370, Poland., Plochocka P; Department of Experimental Physics, Faculty of Fundamental Problems of Technology, Wroclaw University of Science and Technology, Wroclaw 50-370, Poland.; Laboratoire National des Champs Magnétiques Intenses, EMFL, CNRS UPR 3228, Université Grenoble Alpes, Université Toulouse, Université Toulouse 3, INSA-T, 38042 Grenoble, Toulouse 31400, France.
Publikováno v:
Journal of the American Chemical Society [J Am Chem Soc] 2024 Feb 21; Vol. 146 (7), pp. 4687-4694. Date of Electronic Publication: 2024 Feb 07.