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Autor:
H. Komano, Bang-Ching Ho, Chao-Ying Yu, Jen-Chieh Shih, Dah-Chung Owe-Yang, Tin-Yu Lee, R. Hayashi, Takeshi Iwai, T. Hirayama, Meei-Yu Hsui
Publikováno v:
Journal of Photopolymer Science and Technology. 17:541-544
For the enhancement of the Lithography Technology, photo-resist performance, especially in base polymer, has important rules. Currently, in ArF lithography, base polymer of poly-acrylate has been widely selected, but the performance especially in con
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ca448f7cd8d109166921215649db5e06
https://doi.org/10.2494/photopolymer.17.541
https://doi.org/10.2494/photopolymer.17.541
