Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Timothy Michaelson"'
Publikováno v:
Advances in Resist Materials and Processing Technology XXVI.
There is a limit to the minimum feature size that can be printed using current lithographic techniques. For that reason, engineers often employ various shrink methods in production to reduce the size of features generated by lithography. One such tec
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::05f35bc68fb2c5ee7dbdb0f51d055b68
https://doi.org/10.1117/12.814359
https://doi.org/10.1117/12.814359
Autor:
Harald Herchen, Hiram Cervera, Timothy Michaelson, Kim Vellore, Lu Chen, Nikolaos Bekiaris, Brian Lue, Junyan Dai
Publikováno v:
Advances in Resist Materials and Processing Technology XXV.
This paper investigates the feasibility of using an electrostatic chuck (ESC) on a post exposure bake (PEB) plate in the track to improve the critical dimension uniformity (CDU) for bowed wafers. Although it is more conventional to consider vacuum ch
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f75959db2fd4b184953e698a1c123e32
https://doi.org/10.1117/12.772894
https://doi.org/10.1117/12.772894
Publikováno v:
SPIE Proceedings.
Computer simulators are ideal tools to study complex process spaces, but current lithography simulators are based on empirically-derived continuum approximations and thus are unsuited for investigating properties like line edge roughness (LER) becaus
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::85a9002fa386e71880d06b521690c8c8
https://doi.org/10.1117/12.599736
https://doi.org/10.1117/12.599736
Publikováno v:
SPIE Proceedings.
Previous work has demonstrated the dependence of photoresist line edge roughness (LER) on the image-log-slope of the aerial image over a wide range of conditions; however, this relationship does not describe the influence of other factors such as pho
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::89c9eca5195d17db472d9e25765e6485
https://doi.org/10.1117/12.599848
https://doi.org/10.1117/12.599848
Autor:
Alden Acheta, Timothy Michaelson, Jeffrey D. Byers, Andrew Thomas Jamieson, Carlton G Willson, Adam R. Pawloski
Publikováno v:
SPIE Proceedings.
As critical dimensions in microlithography become ever smaller and the importance of line edge roughness becomes more pronounced, it is becoming increasingly important to gain a fundamental understanding of how the chemical composition of modern phot
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d391291aad948d5025522bf32bf48529
https://doi.org/10.1117/12.537658
https://doi.org/10.1117/12.537658
Autor:
Hoang Vi Tran, Darren J. Becker, Timothy Michaelson, Michael D. Stewart, C. Grant Willson, Gerard M. Schmid, Timothy B. Stachowiak
Publikováno v:
SPIE Proceedings.
In a chemically amplified resist the exposure energy is used to generate a catalytic species, which promotes a solubility-switching reaction during a post exposure processing step. Using an absorbed photon to generate a catalyst, instead of using it
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::57808dba0853c6dacb0193bab29b8f62
https://doi.org/10.1117/12.474168
https://doi.org/10.1117/12.474168
Autor:
Todd Bailey, S. Damle, Bernard Choi, Sidlgata V. Sreenivasan, Timothy Michaelson, Matthew E. Colburn, Stephen C. Johnson, John G. Ekerdt, Michael D. Stewart, C. Grant Willson, M. Wedlake
Publikováno v:
SPIE Proceedings.
An alternative approach to lithography is being developed based on a dual-layer imprint scheme. This process has the potential to become a high-throughput means of producing high aspect ratio, high-resolution patterns without projection optics. In th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b1c4805103f9d0401fe8fd9ba70f9a8a
https://doi.org/10.1117/12.351155
https://doi.org/10.1117/12.351155
Autor:
Saul Lee, Elizabeth A. Costner, Matthew J. Schmid, Jason E. Meiring, Timothy Michaelson, Scott M. Grayson, C. Grant Willson
Publikováno v:
Optical Engineering. 48:037201
A pattern-recognition and encoding system has been developed for a biochip platform using shaped hydrogel sensors batch produced via photolithography. Each sensor shape is fashioned with a unique pattern of dots that makes it identifiable to a patter
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::24f8e66730e6935c75bcfa99ddc28239
https://doi.org/10.1117/1.3099722
https://doi.org/10.1117/1.3099722
Autor:
Harry J. Levinson, Andrew Thomas Jamieson, Yukio Nishimura, Carlton G Willson, Timothy Michaelson, Adam R. Pawloski, Alden Acheta
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 5:023001
Line edge roughness (LER) and intrinsic bias of 193-nm photoresist based on two methacrylate polymers are evaluated over a range of base concentration. Roughness is characterized as a function of the image log slope of the aerial image, the gradient
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::85c8ea35a5384fd4dbbb0afe64f36f42
https://doi.org/10.1117/1.2200675
https://doi.org/10.1117/1.2200675