Zobrazeno 1 - 10
of 80
pro vyhledávání: '"Timothy Bean"'
Autor:
Robert G. Hatfield, Timothy Bean, Andrew D. Turner, David N. Lees, James Lowther, Adam Lewis, Craig Baker-Austin
Publikováno v:
Toxicon: X, Vol 2, Iss , Pp - (2019)
The Genus Alexandrium is a widespread dinoflagellate marine phytoplankton that is the primary causative organism causing Paralytic Shellfish Poisoning (PSP) intoxications in European waters. EU food safety directives specify that EU Member States mus
Externí odkaz:
https://doaj.org/article/9a09f1a084684436aed90b24546f6bba
Autor:
Robert G, Hatfield, Timothy, Bean, Andrew D, Turner, David N, Lees, James, Lowther, Adam, Lewis, Craig, Baker-Austin
Publikováno v:
Toxicon: X
The Genus Alexandrium is a widespread dinoflagellate marine phytoplankton that is the primary causative organism causing Paralytic Shellfish Poisoning (PSP) intoxications in European waters. EU food safety directives specify that EU Member States mus
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=pmid________::3a8ce174d604631cf8c48f9fda6d573a
https://pubmed.ncbi.nlm.nih.gov/32550568
https://pubmed.ncbi.nlm.nih.gov/32550568
Publikováno v:
SPIE Proceedings.
As the semiconductor industry continues to strive towards high volume manufacturing for EUV, flatness specifications for photomasks have decreased to below 10nm for 2018 production, however the current champion masks being produced report P-V flatnes
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::55da5579c658bc3e8e616e07a1a2f1c8
https://doi.org/10.1117/12.2240956
https://doi.org/10.1117/12.2240956
Publikováno v:
SPIE Proceedings.
Due to the impact on image placement and overlay errors inherent in all reflective lithography systems, EUV reticles will need to adhere to flatness specifications below 10nm for 2018 production. These single value metrics are near impossible to meet
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::103fae21a1cdf2c45fcdfc699bf21712
https://doi.org/10.1117/12.2242282
https://doi.org/10.1117/12.2242282
Publikováno v:
Enterprise / Salt Lake City. 4/10/2023, Vol. 52 Issue 40, p11-15. 5p.