Zobrazeno 1 - 10
of 15
pro vyhledávání: '"Timothy B. Stachowiak"'
Publikováno v:
Chemistry of Materials. 18:5950-5957
Surface-modified macroporous polymer monoliths that resist the adsorption of proteins have been prepared using both single- and two-step photografting of hydrophilic monomers. The adsorption of protein was measured using a fluorescence assay based on
Publikováno v:
Journal of Chromatography A. 1044:97-111
Electrochromatography (EC) in microfluidic chips is emerging as an attractive alternative to capillary electrophoresis (CE) for on-chip separations. This review summarizes recent developments in the rapidly growing area of chip electrochromatography
Autor:
Frantisek Svec, Jean M. J. Fréchet, Mingqiang Yi, Thomas Rohr, Timothy B. Stachowiak, Dominic S. Peterson, Emily F. Hilder
Publikováno v:
ELECTROPHORESIS. 24:3689-3693
UV-initiated grafting of plastic tubes and microfluidic chips with ethylene diacrylate followed by the preparation of porous polymer monoliths has been studied. The first step affords a thin grafted layer of polymer with a multiplicity of pendent dou
A polyacrylate-based monolithic column bearing cationic functionalities and designed for capillary electrochromatography (CEC) has been prepared via photopolymerization of a mixture of hexyl acrylate, butanediol diacrylate, 2-(acryloyloxy) ethyltrime
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7ab772a3b000affc3a50ea66d2e5c070
https://europepmc.org/articles/PMC2786261/
https://europepmc.org/articles/PMC2786261/
Autor:
Frantisek Svec, Timothy B. Stachowiak
Publikováno v:
Handbook of Capillary and Microchip Electrophoresis and Associated Microtechniques, Third Edition ISBN: 9780849333293
Handbook of Capillary and Microchip Electrophoresis and Associated Microtechniques, Third Edition
Handbook of Capillary and Microchip Electrophoresis and Associated Microtechniques, Third Edition
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8c56655464fb6f3d791d6d5d42b8e97b
https://doi.org/10.1201/9780849333293.ch47
https://doi.org/10.1201/9780849333293.ch47
Autor:
Timothy B. Stachowiak, Timothy C. Logan, Douglas S. Clark, Jean M. J. Fréchet, Frantisek Svec
Publikováno v:
Analytical chemistry. 79(17)
A method for photopatterning multiple enzymes on porous polymer monoliths within microfluidic devices has been developed and used to perform spatially separated multienzymatic reactions. To reduce nonspecific adsorption of enzymes on the monolith, it
Autor:
Frantisek Svec, Jean M. J. Fréchet, Tyler G. Holden, Timothy B. Stachowiak, Dieudonne A. Mair, L. James Lee
Publikováno v:
Journal of separation science. 30(7)
The plastic material known as cyclic olefin copolymer (COC) is a useful substrate material for fabricating microfluidic devices due to its low cost, ease of fabrication, excellent optical properties, and resistance to many solvents. However, the hydr
Autor:
Hoang Vi Tran, Darren J. Becker, Timothy Michaelson, Michael D. Stewart, C. Grant Willson, Gerard M. Schmid, Timothy B. Stachowiak
Publikováno v:
SPIE Proceedings.
In a chemically amplified resist the exposure energy is used to generate a catalytic species, which promotes a solubility-switching reaction during a post exposure processing step. Using an absorbed photon to generate a catalyst, instead of using it
Autor:
Dennis R. McKean, Benjamen M. Rathsack, Peter Pirogovsky, Jeff A. Albelo, Timothy B. Stachowiak, David R. Medeiros, Kathleen Lou, C. Grant Willson, Cyrus Emil Tabery, Peter I. Tattersall
Publikováno v:
SPIE Proceedings.
Photoactive compounds have been designed, synthesized and characterized for deep ultraviolet non-chemically amplified resist applications. These resist materials may have potential use in next generation 257nm mask fabrication. Mask fabrication requi
Autor:
Jeff A. Albelo, C. Grant Willson, Benjamen M. Rathsack, Cyrus Emil Tabery, Timothy B. Stachowiak
Publikováno v:
Advances in Resist Technology and Processing XVII.
The demand for smaller and more uniform features on photomasks has inspired consideration of a DUV (257 nm) resist process for optical pattern generation. Chemically amplified resists require storage and exposure in carbon filtered environments, and