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pro vyhledávání: '"Tim Emig"'
Publikováno v:
SPIE Proceedings.
The progress of immersion lithography toward the 22nm production node is putting more stringent requirements on the diffractive optics that are used for off-axis illumination. Tighter tolerances on pole balance, stray light, zeroth order, optical tra
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::03735007996220368a00299180f5710e
https://doi.org/10.1117/12.827395
https://doi.org/10.1117/12.827395
Publikováno v:
SPIE Proceedings.
As photolithographic tools are pressed to print the ever shrinking features required in todays devices, complex off-axis illumination is taking an ever increasing role in meeting this challenge. This, in turn, is driving tighter, more stringent req
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cb6313b6b8828d51fb51c15c2cf1591f
https://doi.org/10.1117/12.827396
https://doi.org/10.1117/12.827396