Zobrazeno 1 - 10 of 19 pro vyhledávání: '"Tianyang Gai"'
2
Aberration analysis and compensate method of a BP neural network and sparrow search algorithm in deep ultraviolet lithography
Autor: Shuang Zhang, Libin Zhang, Tianyang Gai, Peng Xu, Yayi Wei
Publikováno v: Applied optics. 61(20)
Mass production can be planned by utilizing the multiple patterning technology of 193 nm immersion scanners at the 7 nm technology node. In deep ultraviolet lithography, imaging performance is significantly affected by distortions of projection optic
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::35ba3b93a1800469dd99f89cc1a96304
https://pubmed.ncbi.nlm.nih.gov/36255838
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3
Understanding and Mitigating Stress Memorization Technique of Induced Layout Dependencies for NMOS HKMG Device
Autor: Yajuan Su, Qing-Chun Zhang, Ying-Fei Wang, Rui Chen, Tianyang Gai, Libin Zhang, Ping Li, Xiaojing Su, Lisong Dong, Yayi Wei, Tian Chun Ye
Publikováno v: IEEE Journal of the Electron Devices Society, Vol 9, Pp 6-9 (2021)
For the first time, this research addresses the notable layout proximity effects induced by stress memorization technique in planer high-k/Metal gate NMOS device systematically, including width effect, different shallow trench spacing effect, and len
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::be32dc7e74a79960d46c8021a0621ec0
https://doi.org/10.1109/jeds.2020.3032957
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4
Semisupervised Hotspot Detection With Self-Paced Multitask Learning
Autor: Yajuan Su, Tianyang Gai, Yayi Wei, Ying Chen, David Z. Pan, Yibo Lin
Publikováno v: IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems. 39:1511-1523
Lithography simulation is computationally expensive for hotspot detection. Machine learning-based hotspot detection is a promising technique to reduce the simulation overhead. However, most learning approaches rely on a large amount of training data
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::9e7ec69cc4dfeaf40b86ff1f01724d4f
https://doi.org/10.1109/tcad.2019.2912948
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6
Hotspot detection in large-scale layout with proposal sampling and feature parameters optimization
Autor: Ying Chen, Yajuan Su, Tong Qu, Shuhan Wang, Yayi Wei, Tianyang Gai, Xiaojing Su
Publikováno v: Journal of Micro/Nanopatterning, Materials, and Metrology. 20
Hotspot detection focused on lithography induced defects becomes crucial at advanced node due to the increasing complexity of the design and manufacture process. Compared with traditional lithography simulation techniques for hotspot detection, machi
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::042560005a0089c71b5c1c217ba22bda
https://doi.org/10.1117/1.jmm.20.4.041208
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7
Litho-aware redundant local-loop insertion framework with convolutional neural network
Autor: Tianyang Gai, Xiaojing Su, Yajuan Su, Yibo Lin, Bojie Ma, Shuhan Wang, Tong Qu, Yayi Wei
Publikováno v: Photomask Technology 2021.
With the VLSI technology shrinking to 7nm and beyond, the Redundant Local Loop (RLL), also known as via pillar, becomes a promising candidate of redundant via insertion due to its compatibility with the unidirectional layout style. Existing RLL inser
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::1ba50c4954116764c0155a71e42ba4a2
https://doi.org/10.1117/12.2601685
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8
Data augmentation in hotspot detection based on generative adversarial network
Autor: Libin Zhang, Yayi Wei, Xiaojing Su, Tong Qu, Yajuan Su, Lisong Dong, Bojie Ma, Peng Xu, Tianyang Gai, Shuhan Wang
Publikováno v: Journal of Micro/Nanopatterning, Materials, and Metrology. 20
Background: In datasets for hotspot detection in physical verification, data are predominantly composed of non-hotspot samples with only a small percentage of hotspot ones; this leads to the class imbalance problem, which usually hinders the performa
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::f496bda3064f4b412844a7b93276f466
https://doi.org/10.1117/1.jmm.20.3.034201
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9
Projection-based high coverage fast layout decomposing algorithm of metal layer for accelerating lithography friendly design at full chip level
Autor: Xiaojing Su, Dong Shen, Lisong Dong, Rui Chen, Yayi Wei, Tianyang Gai, Yajuan Su, Libin Zhang
Publikováno v: Journal of Micro/Nanopatterning, Materials, and Metrology. 20
Background: As semiconductor technologies continue to shrink, optical proximity correction may not have enough space to optimize layout due to limitations from adjacent layers. Lithography friendly design (LFD) becomes a powerful tool to detect poten
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::55e0de3f9e98f99ffb4eb0018bdeda8c
https://doi.org/10.1117/1.jmm.20.1.013401
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10
Aberration Analysis and Control Based on Fully Connected Neural Network
Autor: Zhang Shuang, Tianyang Gai, Libin Zhang, Pengzheng Gao, Yayi Wei
Publikováno v: 2021 China Semiconductor Technology International Conference (CSTIC).
Thermal aberration of a projection lens, which is caused by lens heating, leads to degradation of imaging quality in the Deep Ultraviolet Lithography (DUVL). Two tasks have been done in this article. One is to analyze the impact of single aberration
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::e5850aa58136ed40f3d471e6816ed542
https://doi.org/10.1109/cstic52283.2021.9461551
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