Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Ti Ning"'
Publikováno v:
AOPC 2020: Infrared Device and Infrared Technology.
With the development of infrared technology, large-array infrared focal plane detector is getting more and more popular. In order to solve the problem of reduced reliability when the cooling head is packaged with large-array infrared detector, a new
Publikováno v:
AOPC 2020: Infrared Device and Infrared Technology.
At present, HgCdTe arrays has been commonly used in photodetectors for infrared detection in space system, where they are exposed to the space radiation environment. For high radiation-tolerance and the optimum performance of the detector, surface-pa
Publikováno v:
Journal of Luminescence. 130:1189-1193
Gallium-doped tin oxide (SnO2:Ga) films have been prepared on α-Al2O3 (0 0 0 1) substrates at 500 °C by the pulse mode metalorganic chemical vapor deposition (MOCVD) method. The relative amount of Ga (Ga/(Ga+Sn) atomic ratio) varied from 3% to 15%.
Publikováno v:
Advanced Materials Research. :763-766
12% Gallium-doped tin oxide (SnO2:Ga) single crystalline films have been prepared on α-Al2O3 (0001) substrates by the metalorganic chemical vapor deposition (MOCVD) method. The grown temperatures were varied from 400 to 600°C. According to XRD patt
Publikováno v:
Advanced Materials Research. :787-790
Copper-tin-oxide thin films have been prepared on quartz substrates by the magnetron sputtering method. The structural,optical and electrical properties were investigated. The prepared samples were amorphous, CuSnO3 single crystalline grains with per
Publikováno v:
Advanced Materials Research. :759-762
1-12% {atomic ratio of In/(In+Sn)} indium-doped tin oxide (SnO2:In) films were successfully prepared on sapphire substrates by MOCVD method. HRTEM image showed that the obtained films were single crystalline films. The X-ray photoelectron spectroscop
Publikováno v:
Advanced Materials Research. :771-774
1-10% {atomic ratio of Zn/(Zn+Sn)} zinc-doped tin oxide (SnO2:Zn) films were successfully prepared on sapphire substrates by MOCVD method. The structural, optical and electrical properties of the SnO2:Zn films were investigated. The obtained films we