Zobrazeno 1 - 9 of 9 pro vyhledávání: '"Thorsten Last"'
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Accelerating quantum computer developments
Autor: Garrelt J. N. Alberts, M. Adriaan Rol, Thorsten Last, Benno W. Broer, Cornelis C. Bultink, Matthijs S. C. Rijlaarsdam, Amber E. Van Hauwermeiren
Publikováno v: EPJ Quantum Technology. 8
Product developmentGiven the recent breakthroughs in quantum technology development in R& D labs all over the world, the perspective of high-tech companies has changed.Productdevelopment is initiated next to the existingresearchandtechnologydevelopme
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::4acefbc49d79de57363d9121c6191bcb
https://doi.org/10.1140/epjqt/s40507-021-00107-w
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3
Enabling sub-10nm node lithography: presenting the NXE:3400B EUV scanner
Autor: Mark van de Kerkhof, Hans Jasper, Leon Levasier, Rudy Peeters, Roderik van Es, Jan-Willem Bosker, Alexander Zdravkov, Egbert Lenderink, Fabrizio Evangelista, Par Broman, Bartosz Bilski, Thorsten Last
Publikováno v: Extreme Ultraviolet (EUV) Lithography VIII
With the introduction of its fifth-generation EUV scanner, the NXE:3400B, ASML has brought EUV to High-Volume Manufacturing for sub-10nm node lithography. This paper presents lithographic performance results obtained with the NXE:3400B, characterized
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0f8754328431986d3b7249064a5871a1
https://doi.org/10.1117/12.2258025
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4
Anamorphic imaging at high-NA EUV: mask error factor and interaction between demagnification and lithographic metrics
Autor: Gerardo Bottiglieri, Thorsten Last, Alberto Colina, Eelco van Setten, Gijsbert Rispens, Jan van Schoot, Koen van Ingen Schenau
Publikováno v: 32nd European Mask and Lithography Conference.
This paper presents some of the main imaging properties introduced with the design of a possible new EUV High-NA (NA > 0.5) exposure system with anamorphic projection lens, a concept not new in optics but applied for the first time in semiconductor l
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::af36e1b79ee9c6d53f8c5d1a929ddbd6
https://doi.org/10.1117/12.2250630
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5
Illumination pupil optimization in 0.33-NA extreme ultraviolet lithography by intensity balancing for semi-isolated dark field two-bar M1 building blocks
Autor: Thorsten Last, Laurens de Winter, Paul van Adrichem, Jo Finders
Publikováno v: Journal of Micro/Nanolithography, MEMS, and MOEMS. 15:043508
We shed light on the optimization of lithographic metrics for the semi-isolated dark field two-bar logic building block. Under standard D90Y illumination, this building block suffers from large mask three-dimensional-induced relative focus-dependent
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::6f6e4b3241e93204d55872f3ab0dd489
https://doi.org/10.1117/1.jmm.15.4.043508
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6
Mitigation of mask three-dimensional induced phase effects by absorber optimization in ArFiand extreme ultraviolet lithography
Autor: Jo Finders, Laurens de Winter, Thorsten Last
Publikováno v: Journal of Micro/Nanolithography, MEMS, and MOEMS. 15:021408
We will summarize our work on mask topography-induced effects over the last 5 years. We will give a full physical explanation of the effects that can be observed from exposed wafers in state-of-the-art immersion and extreme ultraviolet photolithograp
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::3949f45b3d51729c08dddd47a6e7f7ba
https://doi.org/10.1117/1.jmm.15.2.021408
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7
Evaluation of electrocardiogram beat detection algorithms: patient specific versus generic training
Autor: Thorsten Last, Chris D Nugent, Frank J Owens
Publikováno v: 2007 29th Annual International Conference of the IEEE Engineering in Medicine and Biology Society.
The present study discusses two different training techniques for electrocardiogram (ECG) beat detection algorithms. The first technique is a patient specific training method which uses data from the patient's ECG signal to train the beat detector. T
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::417e4ac30d55ebcf6327cc41587fbb11
https://doi.org/10.1109/iembs.2007.4353012
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8
Multi-component based cross correlation beat detection in electrocardiogram analysis
Autor: Thorsten Last, Chris D Nugent, Frank J Owens
Publikováno v: BioMedical Engineering
BioMedical Engineering OnLine, Vol 3, Iss 1, p 26 (2004)
Background The first stage in computerised processing of the electrocardiogram is beat detection. This involves identifying all cardiac cycles and locating the position of the beginning and end of each of the identifiable waveform components. The acc
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::6e3cb02fc6f88d5207cec93aeab910ad
http://europepmc.org/articles/PMC497048
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9
Contrast optimization for 0.33NA EUV lithography
Autor: Jo Finders, Sander Wuister, Thorsten Last, Gijsbert Rispens, Eleni Psari, Jan Lubkoll, Eelco van Setten, Friso Wittebrood
Publikováno v: Extreme Ultraviolet (EUV) Lithography VII
0.33 NA EUV lithography is expected to be introduced into High Volume Manufacturing at k1 values of approximately 0.4...0.5. This is significantly larger than state of the art immersion lithography which can operate at k1 of 0.3. We investigated the
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4a47852bed4de9833af59f65ab29aa2d
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