Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Thomas Vitrani"'
Autor:
Charlotte Pouligny, Vivien Carlini, Laurie McHale, Chris W. Rella, Kai M. Skog, Mohammed Fabin Shakila, Ambre Steiner, Thomas Vitrani
Publikováno v:
Metrology, Inspection, and Process Control XXXVI.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3cdd1ea049c122b10cbce06fe94f825c
https://doi.org/10.1117/12.2614119
https://doi.org/10.1117/12.2614119
Autor:
Aurélie Mizzi, Sasho Gligorovski, Irène Poulet, Nathalie Hayeck, Rachel Gemayel, Sabrine Tlili, Thomas Vitrani, Henri Wortham, Nicolas Pic, Brice Temime-Roussel, Philippe Maillot
Publikováno v:
International Journal of Mass Spectrometry
International Journal of Mass Spectrometry, Elsevier, 2015, 392, pp.102-110. ⟨10.1016/j.ijms.2015.09.017⟩
International Journal of Mass Spectrometry, 2015, 392, pp.102-110. ⟨10.1016/j.ijms.2015.09.017⟩
International Journal of Mass Spectrometry, Elsevier, 2015, 392, pp.102-110. ⟨10.1016/j.ijms.2015.09.017⟩
International Journal of Mass Spectrometry, 2015, 392, pp.102-110. ⟨10.1016/j.ijms.2015.09.017⟩
International audience; The organic contamination has been recently considered as the most important problem for the photolithography world in the semiconductor industry, especially when the photolithographic methods moved from 130 nm node to 32 nm n
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4a4b14e97243074831b3ac60d93dc755
https://hal.archives-ouvertes.fr/hal-01436875
https://hal.archives-ouvertes.fr/hal-01436875
Autor:
Aurélie Mizzi, Irène Poulet, Thomas Vitrani, Henri Wortham, Sasho Gligorovski, Philippe Maillot, Nicolas Pic, Brice Temime-Roussel, Nathalie Hayeck
Publikováno v:
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXVIII
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXVIII, 2014, Unknown, Unknown Region. ⟨10.1117/12.2045579⟩
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXVIII, 2014, Unknown, Unknown Region. ⟨10.1117/12.2045579⟩
Conference on Metrology, Inspection, and Process Control for Microlithography XXVIII, San Jose, CA, FEB 24-27, 2014; International audience; Refractory compounds such as Trimethylsilanol (TMS) and other organic compounds such as propylene glycol meth
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::cd2b61e73ac1ba469aea0c167a7b9289
https://hal.archives-ouvertes.fr/hal-01456411
https://hal.archives-ouvertes.fr/hal-01456411