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pro vyhledávání: '"Thomas Vavul"'
Autor:
Maciej Rudzinski, Aditya Dayal, John Miller, Mark Wylie, Craig Wood, Dan Chalom, Gang Pan, Michael Green, Trent Hutchinson, Thomas Vavul, Shad Hedges, Jeff McMurran, Carl Hess
Publikováno v:
SPIE Proceedings.
The Critical Dimension Uniformity (CDU) specification on photomasks continues to decrease with each successive node. The ITRS roadmap for optical masks indicates that the CDU (3 sigma) for dense lines on binary or attenuated phase shift mask is 3.4nm
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ee79e78870f42ff84d56e728eecd6c02
https://doi.org/10.1117/12.830148
https://doi.org/10.1117/12.830148
