Zobrazeno 1 - 10
of 33
pro vyhledávání: '"Thomas R. Albrecht"'
Autor:
Daniel F, Sunday, Xuanxuan, Chen, Thomas R, Albrecht, Derek, Nowak, Paulina Rincon, Delgadillo, Takahiro, Dazai, Ken, Miyagi, Takaya, Maehashi, Akiyoshi, Yamazaki, Paul F, Nealey, R Joseph, Kline
Publikováno v:
Chem Mater
The challenges of patterning next generation integrated circuits have driven the semiconductor industry to look outside of traditional lithographic methods in order to continue cost effective size scaling. The directed self-assembly (DSA) of block co
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=pmid________::238a3075cd2017eafb41dee015c3f3fd
https://pubmed.ncbi.nlm.nih.gov/33100517
https://pubmed.ncbi.nlm.nih.gov/33100517
Publikováno v:
ACS Nano. 11:7666-7673
Directed self-assembly (DSA) of block copolymer (BCP) thin films, especially with density multiplication, is one of the most promising options for further improving resolution and throughput in nanolithography. However, controlling defect density has
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::9bc48faac21e160809231d13131f2996
https://doi.org/10.1021/acsnano.7b03284
https://doi.org/10.1021/acsnano.7b03284
Publikováno v:
Macromolecules. 50:1037-1046
We study the line roughness in poly(styrene-b-methyl methacrylate) symmetric block copolymer thin films and propose a phenomenological model to fit and describe the observed line edge, width, and placement roughness. Owing to the layering structure o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::768291ee803e611cc05be6e74e14c5b3
https://doi.org/10.1021/acs.macromol.6b02399
https://doi.org/10.1021/acs.macromol.6b02399
Autor:
Christopher J. Ellison, Julia D. Cushen, Thomas R. Albrecht, Gregory Blachut, Ricardo Ruiz, C. Grant Willson, Michael J. Maher, Lei Wan
Publikováno v:
ACS Applied Materials & Interfaces. 7:13476-13483
The directed self-assembly (DSA) of two sub-20 nm pitch silicon-containing block copolymers (BCPs) was accomplished using a double-patterned sidewall scheme in which each lithographic prepatterned feature produced two regions for pattern registration
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::50f1f78d7e2e3f50752a4ad042a9f32d
https://doi.org/10.1021/acsami.5b02481
https://doi.org/10.1021/acsami.5b02481
Autor:
Dan S. Kercher, Jeffrey S. Lille, Daniel Bedau, Kanaiyalal C. Patel, Dieter Weller, Manfred Ernst Schabes, E. Dobisz, Lei Wan, He Gao, Ricardo Ruiz, Michael Grobis, Tsai-Wei Wu, Olav Hellwig, Thomas R. Albrecht, Ernesto E. Marinero
Publikováno v:
IEEE Transactions on Magnetics. 49:773-778
Bit patterned media (BPM) provide an alternative to conventional granular thin film recording media, circumventing the challenges of managing grain size and its associated noise and thermal stability issues in granular media. A viable fabrication str
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6e1878e6641f67b5a5815a7270117b39
https://doi.org/10.1109/tmag.2012.2227303
https://doi.org/10.1109/tmag.2012.2227303
Autor:
Thomas R. Albrecht, En Yang, Tsai-Wei Wu, Detlef Spoddig, B. D. Terris, Bruce A. Gurney, Michael Grobis, Daniel Bedau, Vipin Ayanoor-Vitikkate, Zuwei Liu, Hitesh Arora
We present a method for growing bit patterned magnetic recording media using directed growth of sputtered granular perpendicular magnetic recording media. The grain nucleation is templated using an epitaxial seed layer, which contains Pt pillars sepa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0ff4527cd0ed9ace0b4ee26ef0ae0a7b
http://arxiv.org/abs/1606.05370
http://arxiv.org/abs/1606.05370
Autor:
Ricardo Ruiz, Junghoon Jahng, Derek Nowak, Kristin Schmidt, Sung Park, H. Kumar Wickramasinghe, Lei Wan, Jane Frommer, Eric O. Potma, Thomas R. Albrecht, William Morrison, Daniel P. Sanders
Publikováno v:
Science Advances
Photoinduced force microscopy resolves nanometer-scale topology with chemical recognition based on material absorption.
Correlating spatial chemical information with the morphology of closely packed nanostructures remains a challenge for the sci
Correlating spatial chemical information with the morphology of closely packed nanostructures remains a challenge for the sci
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::cffbec88b15b9fee52e1cd476f1103fd
https://doi.org/10.1126/sciadv.1501571
https://doi.org/10.1126/sciadv.1501571
Publikováno v:
ACS Nano. 5:79-84
We report a nanofabrication method that combines block copolymer directed assembly with e-beam lithography to achieve highly uniform rectangular patterns with a critical dimension of 16 nm, a full pitch of 27 nm, and arbitrary aspect ratio. This fabr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1425211c4e06250f95bde80dc8cfac55
https://doi.org/10.1021/nn101561p
https://doi.org/10.1021/nn101561p
Autor:
Bruce D. Terris, Jordan A. Katine, Elizabeth A. Dobisz, Thomas Dudley Boone, Dan S. Kercher, Hiroaki Nemoto, Neil Leslie Robertson, Vijay Prakash Singh Rawat, Akemi Hirotsune, Hamid Balamane, Chie C. Poon, Olav Hellwig, Jui-Lung Li, Ricardo Ruiz, Thomas R. Albrecht, Timothy C. Strand, Barry Cushing Stipe
Publikováno v:
Nature Photonics. 4:484-488
A recording density of 1.5 Pb m−2 using heat-assisted magnetic recording in a bit-patterned media is demonstrated. This represents a dramatic improvement in track width and optical efficiency over continuous media, owing largely to advantageous nea
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bb851e9b3b185e9225c5991a301e7f4f
https://doi.org/10.1038/nphoton.2010.90
https://doi.org/10.1038/nphoton.2010.90
Autor:
Thomas R. Albrecht, Yi Cao, Jian Yin, Lei Wan, He Gao, Guanyang Lin, Kanaiyalal C. Patel, Ricardo Ruiz, Ji Hoon Kim
Publikováno v:
ACS nano. 9(7)
We explore the lithographic limits of lamellae-forming PS-b-PMMA block copolymers by performing directed self-assembly and pattern transfer on a range of PS-b-PMMA materials having a full pitch from 27 to 18.5 nm. While directed self-assembly on chem
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::45750ead46c835e48e56714df71dbc63
https://pubmed.ncbi.nlm.nih.gov/26046475
https://pubmed.ncbi.nlm.nih.gov/26046475