Zobrazeno 1 - 10
of 20
pro vyhledávání: '"Thomas H. Osterheld"'
Publikováno v:
The Journal of Physical Chemistry. 98:6995-7003
published in Advance ACS Abstracts, January 1, 1994. sure.21-23 One of the most common reactants used in these processes is methyltrichlorosilane (CH3SiC13, MTS), which is favored because it is nonpyrophoric and inexpensive. It has been shown that MT
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::25891b27a73468e39823ee93d039381e
https://doi.org/10.1021/j100079a018
https://doi.org/10.1021/j100079a018
Publikováno v:
The Journal of Physical Chemistry. 98:5931-5934
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ad3d506b6a1894a4c452979cf5e0c39c
https://doi.org/10.1021/j100074a019
https://doi.org/10.1021/j100074a019
Autor:
Thomas H. Osterheld, John I. Brauman
Publikováno v:
Journal of the American Chemical Society. 115:10311-10316
Infrared multiple-photon dissociation experiments were used to study the energy dependence of the nonstatistical dissociation of the acetone enol cation. This ion isomerizes to the acetone cation, which then loses its methyl groups at unequal rates.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2b7886751f4b8d1c300c49b129b3143c
https://doi.org/10.1021/ja00075a054
https://doi.org/10.1021/ja00075a054
Publikováno v:
Journal of the American Chemical Society. 115:6284-6289
The dissociation of nitrobenzene cation displays a variety of surprising and even apparently nonstatistical reaction behaviors. We have used infrared multiple-photon dissociation experiments to further study the reactions of this system. These experi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::524fc5b1625911a4b0b0c5085d18965e
https://doi.org/10.1021/ja00067a049
https://doi.org/10.1021/ja00067a049
Autor:
Garlen C. Leung, Christopher Heung-Gyun Lee, Sean Cui, Thomas H. Osterheld, Balaji Chandrasekaran, Lakshmanan Karuppiah, Anand N. Iyer, Jie Diao, Jun Qian
Publikováno v:
2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
The extension of Moore's Law at the 45/32nm nodes is made possible by the introduction of high-k metal gate. In the gate-last scheme to integrate high-k metal gate, planarization and surface topography control have been reported as some of the bigges
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8216c01421a5792b8a11c43859c2081d
https://doi.org/10.1109/asmc.2010.5551458
https://doi.org/10.1109/asmc.2010.5551458
Autor:
Thomas H. Osterheld, John I. Brauman
Publikováno v:
Journal of the American Chemical Society. 114:7158-7164
Infrared multiple photon dissociation experiments on acetone cation and d 6 -acetone cation indicate that the hydrogen atom abstraction resulting in methane loss does not involve tunneling. The large isotope effect arises from a competitive mechanism
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6f8fae7f4d19c929398e3b93e6da8670
https://doi.org/10.1021/ja00044a031
https://doi.org/10.1021/ja00044a031
Publikováno v:
MRS Proceedings. 613
Wafers where deposited with BPSG films having phosphorus concentration varying from 3.65 to 6.25% and boron concentration varying from 4 to 5.7%. These wafers were polished using CMP and the rates were found to depend on dopant concentrations. A fit
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::633b01ba498ecc6cbf7be93718e51d20
https://doi.org/10.1557/proc-613-e8.6.1
https://doi.org/10.1557/proc-613-e8.6.1
Autor:
Benjamin A. Bonner, Terence Gan, Thomas H. Osterheld, Peter McKeever, Brian Lee, Duane S. Boning, Jeffrey Drue David
Publikováno v:
MRS Proceedings. 613
A new set of wafer-scale patterns has been designed for analysis and modeling of key CMP effects. In particular, the goal of this work is to develop methods to characterize the planarization capability of a CMP process using simple measurements on wa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::444afbebc979686c3812b0be90d6fc54
https://doi.org/10.1557/proc-613-d11.8.1/e8.8.1
https://doi.org/10.1557/proc-613-d11.8.1/e8.8.1
Autor:
Raymond R. Jin, Sidney P. Huey, Chad Garretson, Peter McKeever, Thomas H. Osterheld, Doyle E. Bennett, Ben Bonner, Steve Zuniga
Publikováno v:
MRS Proceedings. 566
This paper reports a technological advancement in developing and implementing a novel retaining ring of advanced edge performance (AEPTM ring) for an advanced polishing head design. The AEP ring has been successfully used for significantly improved C
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::14391dae3cbb74a5c75166f8946a4ee1
https://doi.org/10.1557/proc-566-63
https://doi.org/10.1557/proc-566-63
Autor:
John I. Brauman, Thomas H. Osterheld
Publikováno v:
Journal of the American Chemical Society. 112:2014-2016
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::872b8720f9e4c150bd89043aacd6cd81
https://doi.org/10.1021/ja00161a065
https://doi.org/10.1021/ja00161a065