Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Thomas Faure"'
Autor:
Yusuke Toda, Takeshi Isogawa, Michael Fahrenkopf, Yoshifumi Sakamoto, Richard Wistrom, Masayuki Kagawa, Jed H. Rankin, Amy E. Zweber, Thomas Faure, Steven Nash
Publikováno v:
SPIE Proceedings.
Over time mask makers have been driven to low sensitivity e-beam resist materials to meet lithographic patterning needs. For 7-nm logic node, resolution enhancement techniques continue to evolve bringing more complexity on mask and additional mask bu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::97b66a2c541fa69e8087a871cf6a04f9
https://doi.org/10.1117/12.2243683
https://doi.org/10.1117/12.2243683
Autor:
Richard Wistrom, Masayuki Kagawa, Kazuhiro Nishikawa, Yoshifumi Sakamoto, Takeshi Isogawa, Yusuke Toda, Mark Lawliss, Kazunori Seki, Yukio Inazuki, Lin Hu, Ramya Viswanathan, Thomas Faure, Yongan Xu, Amy E. Zweber, Karen D. Badger, Granger Lobb
Publikováno v:
SPIE Proceedings.
In this paper we will describe the development of a new 12% high transmission phase shift mask technology for use with the 10 nm logic node. The primary motivation for this work was to improve the lithographic process window for 10 nm node via hole p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::74ad0d0421b8403040ccc386f926cf47
https://doi.org/10.1117/12.2241480
https://doi.org/10.1117/12.2241480
Autor:
Luisa D. Bozano, Ratnam Sooriyakumaran, Takayuki Nagasawa, Satoshi Watanabe, Yoshio Kawai, Shinpei Kondo, Jun Kotani, Masayuki Kagawa, Linda K. Sundberg, Martha I. Sanchez, Elizabeth M. Lofano, Charles T. Rettner, Tasuku Senna, Thomas Faure
Publikováno v:
SPIE Proceedings.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2f48889549b746002413eee8f1b08e16
https://doi.org/10.1117/12.977181
https://doi.org/10.1117/12.977181