Zobrazeno 1 - 10
of 19
pro vyhledávání: '"Thomas Cardolaccia"'
Autor:
Ke Yang, Amy Kwok, Joshua A. Kaitz, Choong Bong Lee, Ryan Lee, Thomas Cardolaccia, Xisen Hou, Amiel Evans, Mingqi Li
Publikováno v:
Advances in Patterning Materials and Processes XXXVIII.
To maximize value in integrated circuit manufacturing, semiconductor manufacturers continually seek materials that enable processing with higher throughput and which provide higher yield. 193nm immersion lithography (193i) has been a mainstay in semi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d308a559bafba23deb2dbf646e061712
https://doi.org/10.1117/12.2583735
https://doi.org/10.1117/12.2583735
Autor:
Alexey Y. Koposov, Paul Szymanski, Milan Sykora, Thomas J. Meyer, Thomas Cardolaccia, Victor I. Klimov
Publikováno v:
Advanced Functional Materials. 21:3159-3168
Chemical and electronic interactions between CdSe nanocrystal quantum dots (NQDs) and Ru-polypyridine complexes are studied in solution. It is shown that photoluminescence (PL) can be used to effectively monitor the formation of NQD-complex assemblie
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3e66cb2f2c7435f15954a529ade29a33
https://doi.org/10.1002/adfm.201100415
https://doi.org/10.1002/adfm.201100415
Autor:
Jong Keun Park, Yi Liu, Young Cheol Bae, Cecily Andes, Young Seok Kim, Thomas Cardolaccia, Seung-Hyun Lee, Jibin Sun, Rosemary Bell, Georgee G. Barclay
Publikováno v:
Journal of Photopolymer Science and Technology. 24:211-217
The effect of molecular weights of 193nm resist polymers on the negative tone development (NTD) process was studied in three different solvent developers. By optimizing the polymer structures for the NTD process, it was possible to improve the dissol
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2e4ddab1bb0901ff597c1682ffcf96f8
https://doi.org/10.2494/photopolymer.24.211
https://doi.org/10.2494/photopolymer.24.211
Autor:
Troy E. Knight, Joseph M. DeSimone, M. Kyle Brennaman, Ashish A. Pandya, Thomas J. Meyer, Thomas Cardolaccia, Anna P. Goldstein
Publikováno v:
The Journal of Physical Chemistry B. 115:64-70
Photophysical properties of the salts [Ru(bpy)(3)](p-Tos)(2), [Ru(dmb)(3)](PF(6))(2), [Ru(vbpy)(3)](PF(6))(2), and [Ru(phen)(3)](p-Tos)(2) (bpy = 2,2'-bipyridine, dmb = 4,4'-dimethyl-2,2'-bipyridine, vbpy = 4-methyl-4'-vinyl-2,2'-bipyridine, phen = 1
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f2dcfc90e359ff70d35fe8eed966adf2
https://doi.org/10.1021/jp107077t
https://doi.org/10.1021/jp107077t
Autor:
Xiaoming Zhao, Kye-Young Kim, Kirk S. Schanze, Ksenija Haskins-Glusac, Eric E. Silverman, Thomas Cardolaccia
Publikováno v:
Coordination Chemistry Reviews. 249:1491-1500
Platinum acetylide oligomers and polymers are π-conjugated materials that display luminescence from the triplet exciton. This property makes platinum acetylides useful for exploring the properties of the triplet state in π-conjugated systems. In th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a79e687696979518dc9d3c0662e5df1e
https://doi.org/10.1016/j.ccr.2004.11.020
https://doi.org/10.1016/j.ccr.2004.11.020
Autor:
Jibin Sun, Seung-Hyun Lee, Cecily Andes, Jong Keun Park, George G. Barclay, Kathleen M. O'Connell, Thomas Cardolaccia
Publikováno v:
SPIE Proceedings.
Herein, we investigate the dissolution behavior of 193-nm chemically amplified resist in different organic solvents at a mechanistic level. We previously reported the effect of solvent developers on the negative tone development (NTD) process in both
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1608d24ec37f44ede88d83e0459a18e1
https://doi.org/10.1117/12.918045
https://doi.org/10.1117/12.918045
Publikováno v:
SPIE Proceedings.
The negative tone development process enables the printing of dark field features on wafer using bright field masks with a manufacturing capability for back-end-of-line processing. The performance of NTD photoresist has advanced along two fronts: nam
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f7027cac3afd5672a3f7f2fb9c66a10f
https://doi.org/10.1117/12.916633
https://doi.org/10.1117/12.916633
Publikováno v:
SPIE Proceedings.
By combining chemical and thermal curing techniques, we developed a simple "hybrid" curing system which offers precise CD control of the first patterns after double patterning. This hybrid curing system involves thermal curing followed by a liquid ri
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3301c8676c896ae6eee08e2aa5fc2947
https://doi.org/10.1117/12.848047
https://doi.org/10.1117/12.848047
Autor:
Ken Spizuoco, Julia Simon, George G. Barclay, Michael Reilly, Gary G. Zhang, Thomas Cardolaccia, Stéphanie Gaurigan, Peter Trefonas, Lori Anne Joesten, John C. McDermott, Amandine Pikon, Yi Liu, Young Cheol Bae
Two different pattern curing techniques were developed to stabilize first lithographic images for the single-etch double patterning process. The first method uses a surface curing agent (SCA) that is coated on top of the patterned surface to form a p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b91e116b56f5886401b02283ca936628
Autor:
Jonah W. Jurss, Joseph L. Templeton, Feng Liu, Thomas J. Meyer, Thomas Cardolaccia, Javier J. Concepcion
Publikováno v:
Inorganic chemistry. 47(6)
The blue dimer, cis, cis-[(bpy)2(H2O)Ru(III)ORu(III)(H2O)(bpy)2](4+), is the first designed, well-defined molecule known to function as a catalyst for water oxidation. It meets the stoichiometric requirements for water oxidation, 2H2O --> -4e(-), -4H
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::cd80fdef9d3a2ff9d5ce64618c5b0f64
https://pubmed.ncbi.nlm.nih.gov/18330966
https://pubmed.ncbi.nlm.nih.gov/18330966