Zobrazeno 1 - 10
of 106
pro vyhledávání: '"Thomas B. Lucatorto"'
Autor:
Charles Tarrio, Thomas B. Lucatorto, Robert F. Berg, Dale E. Newbury, Nicholas W. M. Ritchie, Andrew R. Jones, Frank Eparvier
Publikováno v:
Solar Physics. 298
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d9f311bdee47ed0e10a0188f6d56fee8
https://doi.org/10.1007/s11207-023-02112-x
https://doi.org/10.1007/s11207-023-02112-x
Publikováno v:
Journal of Vacuum Science & Technology A. 41:033204
We present measurements and a model of aluminum oxidation induced by ultraviolet (UV) radiation. Spots of oxide were grown by focusing synchrotron radiation onto a polycrystalline aluminum membrane in the presence of water vapor at pressures from 3
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b4f6c4d8524658a2e014f826b69711ba
https://doi.org/10.1116/6.0002432
https://doi.org/10.1116/6.0002432
Autor:
Andrew R. Jones, D. Woodraska, Thomas B. Lucatorto, Francis G. Eparvier, Brian Templeman, Robert F. Berg, Marie Dominique, Charles S. Tarrio
Publikováno v:
Sol Phys
In spite of strict limits on outgassing from organic materials, some spacecraft instruments making long-term measurements of solar extreme ultraviolet (EUV) radiation still suffer significant degradation. While such measures have reduced the rate of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::70bfc4fed5980dd65889c17153fc0c1d
https://doi.org/10.1007/s11207-021-01806-4
https://doi.org/10.1007/s11207-021-01806-4
Publikováno v:
Journal of Vacuum Science & Technology A. 38:063201
Carbon contamination induced by ultraviolet (UV) radiation affects precision optics in applications as diverse as semiconductor lithography and satellite observations of the Sun. Our previous experiments have shown that low-intensity UV-induced surfa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cd78d5887827a597c4735b2ee09d1eea
https://doi.org/10.1116/6.0000437
https://doi.org/10.1116/6.0000437
Autor:
Charles W. Clark, Charles S. Tarrio, K. Codling, David L. Ederer, Uwe Arp, Thomas B. Lucatorto
Publikováno v:
Synchrotron Radiation News. 28:13-15
Interest in the use of synchrotron radiation (SR) as a source of continuum in the extreme ultraviolet (EUV) spectral region was stimulated by the 1956 Physical Review article by Diran Tomboulian and Paul Hartman [1] of Cornell University. In their al
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c4b7c1877e861c7bf5f49bce7a7c6d77
https://doi.org/10.1080/08940886.2015.1059230
https://doi.org/10.1080/08940886.2015.1059230
Publikováno v:
The Journal of Physical Chemistry C. 117:23072-23081
We report the photodeposition of a carbonaceous layer grown on a TiO2 thin film by extreme ultraviolet (EUV)-induced chemistry of adsorbed n-tetradecane and the subsequent photo-oxidation of this film. Chemical analysis of the carbonaceous layer indi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c8781ba36aeb3389e34a76e8c524cb41
https://doi.org/10.1021/jp4091427
https://doi.org/10.1021/jp4091427
Autor:
Travis Ayers, Robert F. Berg, Charles S. Tarrio, Bruce Lairson, Thomas B. Lucatorto, Heidi Lopez
Publikováno v:
The Review of scientific instruments. 86(11)
We investigated several types of thin-film filters for high intensity work in the extreme-ultraviolet (EUV) spectral range. In our application, with a peak EUV intensity of 2.7 W cm−2, Ni-mesh-backed Zr filters have a typical lifetime of 20 hours,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b57cd136d4a601d38fd80f32bb946632
https://pubmed.ncbi.nlm.nih.gov/26628184
https://pubmed.ncbi.nlm.nih.gov/26628184
Autor:
Thomas B. Lucatorto, B. V. Yakshinskii, Theodore E. Madey, Shannon B. Hill, Nadir S. Faradzhev
Publikováno v:
Bulletin of the Russian Academy of Sciences: Physics. 74:28-32
In this paper we discuss surface phenomena leading to contamination of multilayer optics designed for Extreme Ultraviolet (EUV) lithography. Experimental data supported by calculations indicate dramatic influence of resonance structure of EUV mirror
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1c3b94f04202fcb42faed6a7893a43ce
https://doi.org/10.3103/s1062873810010089
https://doi.org/10.3103/s1062873810010089
Autor:
Jim Rodriguez, Gary Fournier, Shannon B. Hill, Steven E. Grantham, Michael D. Kriese, Yuriy Platonov, John J. Curry, Thomas B. Lucatorto, Charles S. Tarrio
Publikováno v:
SPIE Proceedings.
A critical component of high-performance EUV lithography source optics is the reflecting multilayer coating. The ideal multilayer will have both high reflectance and high stability to thermal load. Additionally the capping layers must provide resista
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9af964e6e936949f92edfbc67fcd7148
https://doi.org/10.1117/12.2085934
https://doi.org/10.1117/12.2085934
Autor:
Dominic Ashworth, Yu-Jen Fan, Ivan Pollentier, Yen-Chih Lin, Eishi Shiobara, Shinya Minegishi, Takeshi Sasami, Toru Fujimori, Charles S. Tarrio, Soichi Inoue, Shannon B. Hill, Isamu Takagi, Robert F. Berg, Yukiko Kikuchi, Thomas B. Lucatorto
Publikováno v:
SPIE Proceedings.
This paper reports on an all-out effort to reduce the intersite gap of the resist outgassing contamination growth in the results obtained under the round-robin scheme. All test sites collaborated to determine the causes of such gaps. First, it was de
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a3c8e3505ce79a55486a44533eaba2a5
https://doi.org/10.1117/12.2085700
https://doi.org/10.1117/12.2085700