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Construction of cold plasma reactor for thin film applications

Autor: Pinto, Henrique Moreira

Publikováno v: Repositório Institucional da UFSCAR
Universidade Federal de São Carlos (UFSCAR)
instacron:UFSCAR

Não recebi financiamento It is about the construction of a sputtering system, through the use of a cold plasma reactor, for the deposition of metallic thin films. Basically, this system works by ejecting atoms from a material (target) by the bombard

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=od______3056::a4a0cd58221524680c8c8441c1130458
https://repositorio.ufscar.br/handle/ufscar/15833

Influence of hydrogen absorption on stress changes in thin catalytic metal films dedicated for sensors application

Autor: Prazmowska Joanna, Piasecki Tomasz, Szyszka Adam, Paszkiewicz Regina, Tłaczała Marek

Publikováno v: Open Physics, Vol 9, Iss 2, Pp 392-397 (2011)

Externí odkaz: https://doaj.org/article/12bd262704d14306af4bf55e38df4fea

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Silicon carbide as a material-based high-impedance surface for enhanced absorption within ultra-thin metallic films

Autor: Jose M. Perez-Escudero, Javier Goicoechea, Miguel Beruete, Iñigo Liberal, Iban Buldain

Publikováno v: Academica-e: Repositorio Institucional de la Universidad Pública de Navarra
Universidad Pública de Navarra
Academica-e. Repositorio Institucional de la Universidad Pública de Navarra
instname

Incluye material complementario The absorption of infrared radiation within ultra-thin metallic films is technologically relevant for different thermal engineering applications and optoelectronic devices, as well as for fundamental research on sub-na

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b41e7c31c4db5d8e505146d9e1c07811
https://hdl.handle.net/2454/39904