Zobrazeno 1 - 10
of 209
pro vyhledávání: '"Thierry Chassagne"'
Autor:
Catherine Moisson, Sylvain Monnoye, Adrien Michon, Marcin Zielinski, Hugues Mank, Marc Portail, Thierry Chassagne
Publikováno v:
Materials Science Forum. 924:306-309
First objective of present contribution is to supply a compact description of two thickness-dependent characteristics of state of the art as-grown 3C-SiC/Si templates: structural quality and surface morphology. Second objective is to point out the be
Autor:
Marcin Zielinski, Sylvie Contreras, Leszek Konczewicz, J. Ben Messaoud, Thierry Chassagne, Tianlin Wang, Sandrine Juillaguet, Hervé Peyre, Roxana Arvinte
Publikováno v:
Materials Science Forum. 897:275-278
Comparative study of p-type 4H-SiC epitaxial layers grown simultaneously on two different 4H-SiC substrates, namely n-type and semi-insulating have been done by different structural, optical and electrical experimental techniques.
Autor:
Marc Portail, Adrien Michon, Pawel Kwasnicki, Marcin Zielinski, Sylvie Contreras, Thierry Chassagne, Hervé Peyre, Sandrine Juillaguet, Leszek Konczewicz, Roxana Arvinte
Publikováno v:
ICSCRM
ICSCRM, Oct 2015, Giardini Naxos, France. pp.137-142, ⟨10.4028/www.scientific.net/MSF.858.137⟩
ICSCRM, Oct 2015, Giardini Naxos, France. pp.137-142, ⟨10.4028/www.scientific.net/MSF.858.137⟩
Exhaustive experimental study of aluminum incorporation in epitaxial 4H-SiC and 3C‑SiC films grown by chemical vapor deposition (CVD) was performed. The influence of polytype and substrate orientation was verified. Role of principal process conditi
Autor:
Marc Portail, Marcin Zielinski, Thierry Chassagne, Daniel Alquier, Rami Khazaka, Jean-François Michaud
Publikováno v:
Materials Science Forum. 858:723-728
The aim of this paper is to review the recent developments conducted for the achievement of 3C-SiC‑based heterostructures compatible with MEMS applications. Indeed, the research activities engaged since years permitted to demonstrate that the defec
Autor:
Michael Krieger, Thierry Chassagne, Marcin Zielinski, Marilena Vivona, Alexandra Gkanatsiou, Fabrizio Roccaforte, Tomasz Sledziewski, Patrick Fiorenza
Publikováno v:
Materials science forum 858 (2016): 663–666. doi:10.4028/www.scientific.net/MSF.858.663
info:cnr-pdr/source/autori:M. Vivona 1, P. Fiorenza 1, T. Sledziewski 2, A. Gkanatsiou 3, M. Krieger 2, T. Chassagne 4, M. Zielinski 4, F. Roccaforte 1/titolo:Processing and characterization of MOS capacitors fabricated on 2°-off axis 4H-SiC epilayers/doi:10.4028%2Fwww.scientific.net%2FMSF.858.663/rivista:Materials science forum/anno:2016/pagina_da:663/pagina_a:666/intervallo_pagine:663–666/volume:858
info:cnr-pdr/source/autori:M. Vivona 1, P. Fiorenza 1, T. Sledziewski 2, A. Gkanatsiou 3, M. Krieger 2, T. Chassagne 4, M. Zielinski 4, F. Roccaforte 1/titolo:Processing and characterization of MOS capacitors fabricated on 2°-off axis 4H-SiC epilayers/doi:10.4028%2Fwww.scientific.net%2FMSF.858.663/rivista:Materials science forum/anno:2016/pagina_da:663/pagina_a:666/intervallo_pagine:663–666/volume:858
In this work, the electrical properties of SiO2/SiC interfaces onto a 2°-off axis 4H-SiC layer were studied and validated through the processing and characterization of metal-oxide-semiconductor (MOS) capacitors. The electrical analyses on the MOS c
Autor:
Marc Portail, Daniel Alquier, Philippe Vennéguès, Marcin Zielinski, Rami Khazaka, Thierry Chassagne, Jean-François Michaud
Publikováno v:
Materials Science Forum. :978-981
We evaluate the influence of the growth parameters on the crystal quality of Si films grown by chemical vapor deposition on 3C-SiC(001)/Si (001) epilayers. It is shown that the pressure plays a major role on the final quality of the films, with two d
Structural Investigation of Si Quantum Dots Grown by CVD on AlN/Si(111) and 3C-SiC/Si(100) Epilayers
Autor:
Monique Teissiere, Adrien Michon, Stéphane Vézian, Thierry Chassagne, Roy Dagher, Marc Portail, Yvon Cordier, Rami Khazaka, Marcin Zielinski
Publikováno v:
Materials Science Forum. :1003-1006
Structural investigations of Si quantum dots (QDs) grown by CVD on two different heterostructures: AlN/Si (111) and 3C-SiC/Si (100) are conducted. The Si QDs have been grown using silane as precursor, diluted in hydrogen, at fixed temperature and pre
Autor:
Marc Portail, Pawel Kwasnicki, Marcin Zielinski, Thierry Chassagne, Sandrine Juillaguet, Adrien Michon, Roxana Arvinte, Hervé Peyre
Publikováno v:
Materials Science Forum. :149-152
An exhaustive experimental study of the influence of C/Si ratio on voluntary incorporation of nitrogen (N) and aluminum (Al) in 4H-SiC thin films is presented. The films were grown by chemical vapor deposition (CVD) in a horizontal, hot wall CVD reac
Autor:
Marc Portail, Thierry Chassagne, Jaweb Ben Messaoud, Jean-François Michaud, Marcin Zielinski, Daniel Alquier
Publikováno v:
International Conference on Silicon Carbide and Related Materials
International Conference on Silicon Carbide and Related Materials, Sep 2017, Washington, United States. pp.318-321, ⟨10.4028/www.scientific.net/MSF.924.318⟩
International Conference on Silicon Carbide and Related Materials, Sep 2017, Washington, United States. pp.318-321, ⟨10.4028/www.scientific.net/MSF.924.318⟩
The silicon carbide cubic polytype (3C-SiC) is perfectly appropriate to fabricate microelectromechanical systems. However, for such applications, the stress can largely influence both the fabrication of 3C‑SiC‑based microsystems and their related
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::76d31eaa1e09462c377b971902d7d46b
https://hal.archives-ouvertes.fr/hal-02017420
https://hal.archives-ouvertes.fr/hal-02017420
Autor:
Adrien Michon, Maxime Bayle, Benoit Jouault, Matthieu Paillet, L. Nguyen, Marcin Zielinski, Yvon Cordier, Roy Dagher, Marc Portail, Thierry Chassagne
Publikováno v:
Materials Science Forum
Materials Science Forum, Trans Tech Publications Inc., 2017, 897, pp.731-734. ⟨10.4028/www.scientific.net/MSF.897.731⟩
Materials Science Forum, Trans Tech Publications Inc., 2017, 897, pp.731-734. ⟨10.4028/www.scientific.net/MSF.897.731⟩
In this study we report the growth of graphene on different silicon carbide substrates by chemical vapor deposition (CVD) in order to understand the influence of the substrate offcut on the graphene layers. For this purpose, graphene was grown on sub
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::6eeb86cf828664c52322470a7faf2cf3
https://hal.archives-ouvertes.fr/hal-01643147
https://hal.archives-ouvertes.fr/hal-01643147