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pro vyhledávání: '"Theresa Moebus"'
Autor:
Hartmut Stöcker, Barbara Abendroth, Solveig Rentrop, Theresa Moebus, Mykola Vinnichenko, R. Strohmeyer, Tobias Weling, Dirk C. Meyer
Publikováno v:
Thin Solid Films. 545:176-182
The atomic layer deposition (ALD) of TiO 2 from tetrakis(dimethylamino)titanium (TDMAT) and water was studied in the substrate temperature ( T S ) range of 120 °C to 330 °C. The effect of deposition temperatures on the resulting layer microstructur
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::50388106ac84e191b53af498b51bb4c7
https://doi.org/10.1016/j.tsf.2013.07.076
https://doi.org/10.1016/j.tsf.2013.07.076
