Zobrazeno 1 - 10
of 10
pro vyhledávání: '"Thangavel Subramani"'
Autor:
Kathiravan Vaiyapuri, Thangavel Subramani, Ashok Kumar Rajamani, Muthu Lakshmi Thangavel, Satheesh Kumar Ganesan, Selvarajan Palanisamy, Kumaresavanji Malaivelusamy
Publikováno v:
Journal of Electronic Science and Technology, Vol 20, Iss 4, Pp 100178- (2022)
Single crystals of l-alanine cadmium iodide (LACI) were grown by adopting the slow evaporation technique at room temperature. A single-crystal X-ray diffraction (SXRD) model was used to evaluate the crystal structure of the as-grown LACI crystal. The
Externí odkaz:
https://doaj.org/article/02ce0e96680341f59cfb2dcdd8fac64e
Publikováno v:
In Journal of Colloid And Interface Science 2011 355(2):293-299
Autor:
Ori Hazut, Roland Kröger, Teresa Roncal-Herrero, Debabrata Sarkar, Thangavel Subramani, Sharon Waichman, Roie Yerushalmi, Sthitaprajna Dash
Publikováno v:
Journal of the American Chemical Society. 138:4079-4086
We present a synthetic strategy that takes advantage of the inherent asymmetry exhibited by semiconductor nanowires prepared by Au-catalyzed chemical vapor deposition (CVD). The metal-semiconductor junction is used for activating etch, deposition, an
Publikováno v:
Journal of Visualized Experiments
Monolayer Contact Doping (MLCD) is a simple method for doping of surfaces and nanostructures1. MLCD results in the formation of highly controlled, ultra shallow and sharp doping profiles at the nanometer scale. In MLCD process the dopant source is a
Publikováno v:
Angewandte Chemie
More than they appear on the surface: The treatment of SiO2 nanoparticles under mild conditions with two organoboron derivatives led to boron-containing monolayers with different types of surface species (see picture) through the direct formation of
Autor:
Arunava Agarwala, Yossi Rosenwaks, Ori Hazut, Iddo Amit, Thangavel Subramani, Roie Yerushalmi, Seva Zaidiner
Publikováno v:
ACS nano. 6(11)
Contact doping method for the controlled surface doping of silicon wafers and nanometer scale structures is presented. The method, monolayer contact doping (MLCD), utilizes the formation of a dopant-containing monolayer on a donor substrate that is b
Autor:
Ori Hazut, Arunava Agarwala, Iddo Amit, Thangavel Subramani, Seva Zaidiner, Yossi Rosenwaks, Roie Yerushalmi
Publikováno v:
ACS Nano.
Autor:
Hazut, Ori, Waichman, Sharon, Thangavel Subramani, Debabrata Sarkar, Sthitaprajna Dash, Roncal-Herrero, Teresa, Kröger, Roland, Roie Yerushalmi
Publikováno v:
Journal of the American Chemical Society; 3/30/2016, Vol. 138 Issue 12, p4070-4086, 8p
Akademický článek
Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.
K zobrazení výsledku je třeba se přihlásit.
Akademický článek
Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.
K zobrazení výsledku je třeba se přihlásit.