Zobrazeno 1 - 10
of 48
pro vyhledávání: '"Th. Schulze"'
Publikováno v:
Wallraf-Richartz-Jahrbuch, 1992 Jan 01. 53, 83-94.
Externí odkaz:
https://www.jstor.org/stable/24661396
Publikováno v:
Microelectronic Engineering. :857-863
We present the first realization of three-dimensional lithography on the nanometer scale using atom optical techniques. It has already been shown that, with atom lithography, two-dimensional lateral structures of 50 nm can be obtained. In our experim
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::17c397201c66714a8fa3d7ff6f341bd1
https://doi.org/10.1016/s0167-9317(01)00442-7
https://doi.org/10.1016/s0167-9317(01)00442-7
Publikováno v:
Applied Physics B. 70:671-674
In atom lithography the conventional roles played by light and matter are reversed. Instead of using a solid mask to pattern a light beam, a mask of light is used to pattern a beam of neutral atoms. In this paper we report the production of different
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e82d0f5113f976431cebfdc40f6e8928
https://doi.org/10.1007/s003400050879
https://doi.org/10.1007/s003400050879
Autor:
Tilman Pfau, U. Drodofsky, Th. Schulze, J. Mlynek, J. Stuhler, S. Nowak, B. Brezger, A. S. Bell
Publikováno v:
Surface Science. :40-47
The general features of atom lithography, such as parallel deposition, large exposure area, nanometer resolution and both direct writing and resist based patterning, make it a promising field. A summary of the present state of neutral atom lithograph
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8db7d614f2fd7bc13e6c7242fc4af8a8
https://doi.org/10.1016/s0039-6028(99)00083-7
https://doi.org/10.1016/s0039-6028(99)00083-7
Publikováno v:
Microelectronic Engineering. 46:105-108
Instead of using a solid mask to pattern a light beam (optical lithography) we used a mask made of light to pattern a beam of neutral atoms (atom lithography). By making use of two special features of the atom-light interaction we wrote structures wi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2d5ab68ed177a054622dca42065afd3b
https://doi.org/10.1016/s0167-9317(99)00026-x
https://doi.org/10.1016/s0167-9317(99)00026-x
Publikováno v:
Europhysics Letters (EPL). 46:148-153
In atom lithography, neutral atoms are focused by laser light to form a periodic pattern on a substrate. We have realized two-dimensional structuring of chromium on a silicon substrate employing a polarization gradient light mask with uniform intensi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f5c4579a8cfe9472d812dafd53d42eb6
https://doi.org/10.1209/epl/i1999-00237-5
https://doi.org/10.1209/epl/i1999-00237-5
Publikováno v:
Applied Physics B: Lasers and Optics. 65:755-759
Cr, different patterns can be generated. Possible applications using the inherent properties of atom lithography, e.g. the fabrication of photonic bandgap material, are discussed.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a4f501856459eccc970348f4bf2c2613
https://doi.org/10.1007/s003400050342
https://doi.org/10.1007/s003400050342
Autor:
M. Drewsen, Tilman Pfau, B. Brezger, Vahid Sandoghdar, Jürgen Mlynek, Th. Schulze, U. Drodofsky
Publikováno v:
Journal of Modern Optics. 44:1883-1898
We discuss the fabrication of various one and two-dimensional chromium nanostructures. A chromium atomic beam effusing out of a thermal oven is first transversally laser cooled. This well-collimated beam is then structured and focused by the optical
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::07db0398db08dd253ae0c171573eff44
https://doi.org/10.1080/09500349708231853
https://doi.org/10.1080/09500349708231853
Publikováno v:
Microelectronic Engineering. 35:285-288
We have used neutral chromium atoms to write periodic nanometerscale structures in a direct way. We use the force exerted on the induced dipole of the atom in the intensity gradient of an optical standing light field to focus an atomic beam onto a su
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f24dbb7018fee3083f3c1379f6ef79e1
https://doi.org/10.1016/s0167-9317(96)00116-5
https://doi.org/10.1016/s0167-9317(96)00116-5
Publikováno v:
Journal of Polymer Science Part A: Polymer Chemistry. 34:81-87
The reaction of 2-methylene-1,3-dioxolanes and 2-methylene-1,3-oxazolidines with benzoyl peroxide (acceptor radical) and with N-ethylmaleimide (acceptor) was investigated. It was shown that benzoyl peroxide adds to monomers 1a and 1b, giving the corr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::262ce52cc495659647d45a436d6f6c2a
https://doi.org/10.1002/(sici)1099-0518(19960115)34:1<81::aid-pola8>3.0.co
https://doi.org/10.1002/(sici)1099-0518(19960115)34:1<81::aid-pola8>3.0.co