Zobrazeno 1 - 10
of 319
pro vyhledávání: '"Th. Kruck"'
Autor:
M. Schober, Th. Kruck
Publikováno v:
Microelectronic Engineering. :121-126
The increasing demand for faster microelectronic circuits with improved performance will force fundamental changes in future semiconductor manufacturing. The realization of deep submicron feature sizes in ultra-large-scale integration (ULSI) devices
Publikováno v:
Applied Surface Science. 91:187-191
The concept of “molecular engineering” has been employed to systematically influence the physical and chemical properties of metalorganic compounds with the aim of using them as precursors in CVD processes. As a result of our studies the compound
Publikováno v:
Applied Surface Science. 86:504-508
Laser-assisted deposition of gold is investigated as a technique for structured metallization of PI. Gold lines are written from MeAuPMe 3 dissolved in toluene or DME by means of an argon laser. The writing speed of the laser process typically is 1 m
Publikováno v:
Materials Science and Engineering: B. 17:104-107
The increasing order of system integration in future chip generations and the demand for new, more sophisticated electronic materials require the development of new processes. A very promising method for generating these materials under convenient co
Publikováno v:
Micro System Technologies 90 ISBN: 9783642456800
An apparatus was set up for laser induced chemical vapor deposition of gold on polyimide. Electrical interconnects were written by thermal decomposition of an organometallic gold compound in an argon ion laser focus. The low decomposition temperature
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::175c15eac9c3e837342b78dc3e0d78b1
https://doi.org/10.1007/978-3-642-45678-7_46
https://doi.org/10.1007/978-3-642-45678-7_46
Publikováno v:
Zeitschrift f�r anorganische und allgemeine Chemie. 405:95-100
SnBr3-nCl-Ionen (n = 0–2) reagieren mit den Hexacarbonylen von Chrom, Molybdan und Wolfram zu den anionischen Monosubstitutionsprodukten [M(CO)5SnBR3−nCln]−. Sie warden den analogen Trichlorstannido-carbonylmetallat(0)-Komplexen gegenubergestel
Publikováno v:
Le Journal de Physique Colloques. 49:C4-541
BSG with constant composition (ca. 4.7 wt% B) was deposited using Tris(trimethylsiloxy) boron B[OSi(CH 3 )3] 3 in a standard LPCVD system. The optimum deposition conditions are 800 °C, 105 Pa (800 mTorr) and 280 sccm O 2 purge. The films are chemica
Publikováno v:
Le Journal de Physique Colloques. 50:C5-747
Publikováno v:
Zeitschrift f�r anorganische und allgemeine Chemie. 414:277-283
In Methylenchlorid setzt sich [As(C6H5)4][SnF3] glatt mit den Metallhexacarbonylen zu den Arsoniumsalzen der Pentacarbonyl-trifluorstannido-metallat(O)-Komplexe [M(CO)5SnF3]− (M Cr, Mo, W) um. Mit [N(C2H5)4][SnJ3] konnte in THF-Losung nur uber das
Publikováno v:
Zeitschrift f�r anorganische und allgemeine Chemie. 422:59-64
Unter UV-Bedingungen in THF liefern [SnCl3]−-Ionen mit den Metall(0)-trifluorphosphinen von Nickel, Eisen und Molybdan die Metallat(0)-Komplexe [Ni(PF3)3SnCl3]−, [Fe(PF3)3(SnCl3)2]2− und [Mo(PF3)5SnCl3]−. Hingegen bildet das bei Substitutions