Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Teun Nevels"'
Publikováno v:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XIV.
Substrate Conformal Imprint Lithography (SCIL) solves the limitations of PDMS soft-stamp based NIL techniques (resolution, pattern deformation, overlay) and allows low-pressure wafer scale conformal contact and sub-10 nm resolution using a novel sili
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::939926ba6fd4cfcb4a00098f30652803
https://doi.org/10.1117/12.2577310
https://doi.org/10.1117/12.2577310
Publikováno v:
Novel Patterning Technologies 2021.
Substrate Conformal Imprint Lithography (SCIL) solves the limitations of PDMS soft-stamp based NIL techniques (resolution, pattern deformation, overlay) and allows low-pressure wafer scale conformal contact and sub-10 nm resolution using a novel sili
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8386466cb06793a5df2a2a56403559c1
https://doi.org/10.1117/12.2583654
https://doi.org/10.1117/12.2583654