Zobrazeno 1 - 10
of 30
pro vyhledávání: '"Tetsuya Nishiguchi"'
Autor:
Tomoharu Ushiyama, Tetsuya Nishiguchi, Naoto Kameda, Yoshiki Morikawa, Ken Nakamura, Hidehiko Nonaka, Shingo Ichimura, Mitsuru Kekura
Publikováno v:
Analytical Sciences. 26:273-276
Using ultraviolet (UV)-excited ozone gas, we prepared high-quality SiO(2) films that can be used as gate dielectric films on poly-silicon or silicon wafers without sample heating. The UV-excited ozone gas was generated by UV irradiation of highly con
Autor:
Naoto Kameda, Tomoharu Ushiyama, Tetsuya Nishiguchi, Yoshiki Morikawa, Mitsuru Kekura, Shingo Ichimura, Hidehiko Nonaka
Publikováno v:
Journal of the Vacuum Society of Japan. 53:230-233
SiO2 film was made on Si(100) by two-step film growth process at 100°C to improve the interface properties. The first part of the process is the direct Si oxidation using UV-excited ozone (O(1D)), which is generated by the UV irradiation to high con
Publikováno v:
Journal of the Vacuum Society of Japan. 51:224-227
Fourier-Transformed Infrared absorption spectroscopy (FT-IR) was applied to analysis of initial photochemical reaction of ozone (O3) and 1,1,1,3,3,3-hexamethyldisilazane (HMDS) at room temperature in the gas phase under the irradiation of an ultravio
Autor:
Shigeru Saito, Tetsuya Nishiguchi, Naoto Kameda, Yoshiki Morikawa, Shingo Ichimura, Hidehiko Nonaka, Mitsuru Kekura
Publikováno v:
Journal of the Vacuum Society of Japan. 51:228-231
Autor:
Yoshiki Morikawa, Shingo Ichimura, Shigeru Saitoh, Tetsuya Nishiguchi, Naoto Kameda, Mitsuru Kekura, Hidehiko Nonaka
Publikováno v:
Japanese Journal of Applied Physics. 46:2835-2839
A low-temperature, damage-free process for growing ultrathin (
Autor:
Shingo Ichimura, Hidehiko Nonaka, Yoshiki Morikawa, Takeshi Noyori, Tetsuya Nishiguchi, Mitsuru Kekura
Publikováno v:
Shinku. 48:313-316
Publikováno v:
Shinku. 48:309-312
UV light-exited ozone has been applied for rapid low-temperature oxidation of silicon in a wafer-transfer type chamber. Oxidation was made in almost 100% ozone atmosphere with KrF excimer laser (248 nm) which enables the effective supply of O (1D) at
Publikováno v:
Shinku. 48:378-381
A local and real-time concentration measuring method for high concentration ozone gas has been developed. The method employs Quadrupole Mass Spectroscopy (QMS) calibrated by low-temperature Thermal Desorption Spectroscopy (TDS). It was impossible to
Autor:
Yoshiki Morikawa, Shingo Ichimura, Tetsuya Nishiguchi, Hidehiko Nonaka, Noyori Tsuyoshi, Mitsuru Kekura
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 22:1410-1414
A system is described which can continuously generate/supply highly concentrated (HC) ozone gas to satisfy the future need for practical low-temperature oxidation. This system comprises four ozone vessels, each with independent temperature control. T
Autor:
Yoshiki Morikawa, Shingo Ichimura, Masaharu Miyamoto, Hidehiko Nonaka, Mitsuru Kekura, Tetsuya Nishiguchi
Publikováno v:
Review of Scientific Instruments. 73:1217-1223
A reactive oxygen beam generation system is described for the formation of high-quality and high-precision films. This system utilizes pulsed laser evaporation of highly concentrated solidified ozone (O3). The equipment for safely generating and hand