Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Tetsuya Katase"'
Publikováno v:
Lecture Notes in Electrical Engineering ISBN: 9783030215064
Large-sized dual-reflector antennas were analyzed to evaluate their performance through long-time simulations using some EM (electromagnetic)methods based on PO (physical optics). To reduce the time/term for their simu-lation/design, we focused on pa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::177a76ec3235f7a000f32ee008d851f9
https://doi.org/10.1007/978-3-030-21507-1_26
https://doi.org/10.1007/978-3-030-21507-1_26
Autor:
Yuichi Haruyama, Shuso Iyoshi, Makoto Okada, Katsuhiko Tone, Tetsuya Katase, Hiroto Miyake, Takao Yukawa, Shinji Matsui
Publikováno v:
Microelectronic Engineering. 112:139-142
Display Omitted We demonstrated two double patterning (DP) processes in nanoimprint lithography.As this work was a proof-of-concept, we used commercially available resins.Despite difficulties arising with respect to pattern deformation, the second pa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ca4d52df98a9ee89b9977fb6cedf0ee6
https://doi.org/10.1016/j.mee.2013.06.009
https://doi.org/10.1016/j.mee.2013.06.009
Autor:
Tetsuya Katase, Katsuhiko Tone, Masaru Nakagawa, Yuichi Haruyama, Shu Kaneko, Kei Kobayashi, Shuso Iyoshi, Hiroshi Hiroshima, Makoto Okada, Shinji Matsui
Publikováno v:
Japanese Journal of Applied Physics. 52:089201
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fd5d7ee1dfec6dcbf6298da5650f9fbd
https://doi.org/10.7567/jjap.52.089201
https://doi.org/10.7567/jjap.52.089201
Autor:
Tetsuya Katase, Katsuhiko Tone, Shuso Iyoshi, Shinji Matsui, Makoto Okada, Kei Kobayashi, Yuichi Haruyama, Masaru Nakagawa, Shu Kaneko, Hiroshi Hiroshima
Publikováno v:
Japanese Journal of Applied Physics. 52:06GJ04
Ultraviolet (UV) nanoimprinting includes a contact process necessary for transferring nanoscale features from a mold to a UV-curable resist coated on a substrate. The demolding that comes with the contact process is a source of defects, and an obstac
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::02be7f028cb111e61021f337492ea5c4
https://doi.org/10.7567/jjap.52.06gj04
https://doi.org/10.7567/jjap.52.06gj04
Autor:
Kei Kobayashi, Hiroshi Hiroshima, Katsuhiko Tone, Shinji Matsui, Masaru Nakagawa, Shu Kaneko, Shuso Iyoshi, Makoto Okada, Yuichi Haruyama, Tetsuya Katase
Publikováno v:
Japanese Journal of Applied Physics. 51:06FJ08
In the UV nanoimprinting process an antisticking layer such as fluorinated self-assembled monolayer (F-SAM) is grafted on the mold surface to diminish the demolding impact. These layers are supposed to deteriorate as the imprint steps mount up, resul
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::36413508b66e29e6246c600918e562ed
https://doi.org/10.1143/jjap.51.06fj08
https://doi.org/10.1143/jjap.51.06fj08