Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Tetsushi Miyamoto"'
Autor:
Gaston Lee, Wolfram Porsche, Tetsushi Miyamoto, Hideo Funakoshi, Shinji Koga, Yoshiki Okamoto, Shigenori Kamei, Shigemi Oono, Takahiro Fukai, Rusty Cantrell, Hiroshi Asai, Martin Tschinkl, Tatsuhito Kotoda, Axel Feicke, Peter Tichy, Kazuhiro Takeshita
Publikováno v:
SPIE Proceedings.
The challenges, mask manufacturing is faced with, are more and more dominating the semiconductor industry as the pattern sizes shrink. Today's mask patterns have reached sizes that are common in wafer manufacturing. Looking into the industry, we can
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5aea07948e24d03fa205a2e63281f5b9
https://doi.org/10.1117/12.568820
https://doi.org/10.1117/12.568820
Autor:
Hiroyasu Takase, Emiri Takeuchi, Hidemitsu Shimada, Tsukasa Kumagai, Naonori Wakamatsu, Tetsushi Miyamoto
Publikováno v:
The proceedings of the JSME annual meeting. :101-102
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c0a67aa2146b22bb47c96276a69d6787
https://doi.org/10.1299/jsmemecjo.2007.3.0_101
https://doi.org/10.1299/jsmemecjo.2007.3.0_101
Autor:
Hidemitsu Shimada, Tsukasa Kumagai, Tetsushi Miyamoto, Hiroyasu Takase, Hisanori Wakamatsu, Emiri Takeuchi
Publikováno v:
The proceedings of the JSME annual meeting. :103-104
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0015eb360e6098cb1d049f1a5f7a3be8
https://doi.org/10.1299/jsmemecjo.2007.3.0_103
https://doi.org/10.1299/jsmemecjo.2007.3.0_103