Zobrazeno 1 - 10
of 37
pro vyhledávání: '"Tetsuro Hanawa"'
Autor:
Yoshiharu Ono, Keiko Matsuda, Masahiro Tadokoro, Atsumi Yamaguchi, Takeshi Matsunobu, Masaaki Shinohara, Takashi Miyamoto, Yuko Mitani, Takeo Ishibashi, Kazumasa Yonekura, Hideaki Hirori, Sachiko Ogawa, Tetsuro Hanawa
Publikováno v:
Journal of Photopolymer Science and Technology. 20:365-372
In this article, we present a novel high-performance multi-layer resist (MLR) process that uses a spin-on carbon (SOC) hard mask (HM). In the process, a technique involving the implantation of ions into the SOC just after coating was employed. B, P,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c5e1e726b230129eae1823b74dd5a304
https://doi.org/10.2494/photopolymer.20.365
https://doi.org/10.2494/photopolymer.20.365
Publikováno v:
Japanese Journal of Applied Physics. 45:5354-5358
We have newly developed a resolution enhancement lithography assisted by chemical shrink (RELACS) material for ArF lithography. Several process performances were evaluated for 65 nm nodes and next-generation devices. The principle and procedure of th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1a493a876c46a6091fb0dc45583dc36f
https://doi.org/10.1143/jjap.45.5354
https://doi.org/10.1143/jjap.45.5354
Autor:
Tomoyuki Ando, Tetsuro Hanawa, Mamoru Terai, Takeo Ishibashi, Teruhiko Kumada, Kazuyuki Suko, Shinroku Maejima, Koichiro Narimatsu, Tsohifumi Suganaga
Publikováno v:
Journal of Photopolymer Science and Technology. 19:547-554
This paper is intended as investigations of two interesting characteristics of ArF immersion lithography using topcoat (TC). On the one hand, we identified several hundreds gel-type defects over large areas of the unexposed top surface of the resist
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9eebf7dd4d2fb5895a3519a8524b8a2b
https://doi.org/10.2494/photopolymer.19.547
https://doi.org/10.2494/photopolymer.19.547
Autor:
Yasushi Fujii, Takeshi Matsunobu, Takeshi Tanaka, Kazunori Yoshikawa, Masahiro Tadokoro, Haruki Okumura, Keiko Matsuda, Tetsuro Hanawa, Kazumasz Yonekura, Takeo Ishibashi, Yoshiharu Ono
Publikováno v:
Journal of Photopolymer Science and Technology. 19:379-384
We investigated that the structural changes in the depth direction of the bottom layer for multi layer process and the effects on improving the resistance against the dry etching process by H2 plasma curing. Diamond like amorphous carbon structure th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1539c4917d841a5fe11d4952ea0fb081
https://doi.org/10.2494/photopolymer.19.379
https://doi.org/10.2494/photopolymer.19.379
Publikováno v:
Denki Kagaku oyobi Kogyo Butsuri Kagaku. 63:499-504
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4016460022786a7b1e51fac368da488e
https://doi.org/10.5796/kogyobutsurikagaku.63.499
https://doi.org/10.5796/kogyobutsurikagaku.63.499
Publikováno v:
Journal of Photopolymer Science and Technology. 6:571-574
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e0e3337e7af79ef44541ff5e8b0ac463
https://doi.org/10.2494/photopolymer.6.571
https://doi.org/10.2494/photopolymer.6.571
Publikováno v:
Journal of Photopolymer Science and Technology. 5:169-172
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c58a9b004fb0f8e1663ca4a12ad1d4cb
https://doi.org/10.2494/photopolymer.5.169
https://doi.org/10.2494/photopolymer.5.169
Autor:
Tetsuro Hanawa, Itaru Kanai, Shinroku Maejima, Kazuyuki Suko, Shuji Nakao, Junjiro Sakai, Mitsuru Okuno, Naohisa Tamada, Akira Imai
Publikováno v:
SPIE Proceedings.
Authors would like to raise a discussion about image intensity for surface exposure, off course, including optical lithography. As a springboard for the discussion, a novel definition of image "intensity", which expresses local irradiance associating
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0b6272efa09610cb50fce09cfdae12fe
https://doi.org/10.1117/12.812203
https://doi.org/10.1117/12.812203
Autor:
Tomofumi Miyauchi, Yusaku Tanahashi, Takeshi Matsunobe, Takeo Ishibashi, Kosuke Doi, Tomoya Kumagai, Tetsuro Hanawa, Mamoru Terai, Takuya Hagiwara, Atsushi Sawano, Naoki Man, Hirofumi Seki, Teruhiko Kumada, Shinya Hori
Publikováno v:
Advances in Resist Materials and Processing Technology XXVI.
A non-topcoat (non-TC) resist is a photoresist that contains a hydrophobic additive, which segregates to the surface and forms a layer to minimize surface free energy. The improvement of surface hydrophobicity and the suppression of resist component
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a038918c340eaa4fc951462889be1fae
https://doi.org/10.1117/12.813643
https://doi.org/10.1117/12.813643
Autor:
Shuji Nakao, Sachiko Ogawa, Kazuyuki Suko, Shinroku Maejima, Takuya Hagiwara, Yuko Mitarai, Tetsuro Hanawa
Publikováno v:
SPIE Proceedings.
~30nm width isolated line is formed with over 300nm DOF by Single Exposure process of ArF immersion lithography. Super-Diffraction-Lithography ("SDL") technique, which utilizes fine dark line image formed between a pair of bright lines in attenuating
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f8d00d49ee9e8e9f1c581ccb410200ac
https://doi.org/10.1117/12.793123
https://doi.org/10.1117/12.793123