Zobrazeno 1 - 10
of 29
pro vyhledávání: '"Tetsuo Oda"'
Publikováno v:
IEEE Transactions on Electron Devices. 68:3505-3512
This article describes an analysis of the electric-field-dependence mechanism for cosmic ray failure in power semiconductor devices. Two major modes for the failure have been reported. One is bipolar transistor activation caused by carrier generation
Autor:
Tetsuo Oda, Toru Masuda, Takashi Ishigaki, Seiichi Hayakawa, Tatsunori Murata, Yuji Takayanagi
Publikováno v:
IEEE Transactions on Electron Devices. 67:2035-2043
A 3.3-kV diode-less (D-less) SiC power module adopting a “next high power density dual package” (named nHPD2) was developed. Configuring the module with SiC metal–oxide–semiconductor field-effect transistors (MOSFETs) only resulted in the ult
Publikováno v:
IEEE Transactions on Aerospace and Electronic Systems. 53:1384-1401
形態: カラー図版あり
Physical characteristics: Original contains color illustrations
This work was partially supported by JSPS KAKENHI under Grant JP22560779 and Grant JP26289320.
資料番号: PA1710064000
Physical characteristics: Original contains color illustrations
This work was partially supported by JSPS KAKENHI under Grant JP22560779 and Grant JP26289320.
資料番号: PA1710064000
Autor:
Tatsunori Murata, Kumiko Konishi, Yuki Mori, Takahiro Morikawa, Koyo Kinoshita, Tetsuo Oda, Fujita Ryuusei, Takashi Ishigaki, Akio Shima
Publikováno v:
2019 31st International Symposium on Power Semiconductor Devices and ICs (ISPSD).
We have developed a 3.3 kV ultra-high power density SiC power module, which was realized by fulfilment with only SiC-MOSFETs. As a countermeasure for bipolar degradation issues related to body diodes in the MOSFET structure, a high throughput screeni
Autor:
Hiroshi Miki, Kan Yasui, Takashi Hirao, Yoshiaki Toyota, Mutsuhiro Mori, Hiroyuki Okino, Jiro Hasegawa, Kazuhiro Mochizuki, Norifumi Kameshiro, Tetsuo Oda, Hiroyuki Matsuhima, Hidekatsu Onose, Renichi Yamada, Natsuki Yokoyama
Publikováno v:
Materials Science Forum. 858:1091-1094
A 3.3-kV SiC-Si hybrid module, composed of a low-forward-voltage (VF) SiC junction-barrier-Schottky (JBS) diode and a low-saturation-voltage VCE(sat) Si trench IGBT was fabricated and demonstrated highly efficient operation.
Publikováno v:
2017 29th International Symposium on Power Semiconductor Devices and IC's (ISPSD).
We have proposed the concept of thin layer SOI devices with stepped field plates to obtain a low on-resistance LDMOSFET. Thin layer SOI devices can acquire a high breakdown voltage because the ionization integral over the vertical path may be neglect
Autor:
Hiroki Yamashita, Tomoyuki Utsumi, Tetsuo Oda, S. Wada, Junichi Sakano, Kenji Sakurai, Kenji Hara
Publikováno v:
2014 IEEE 26th International Symposium on Power Semiconductor Devices & IC's (ISPSD).
A 600V three-phase single chip inverter IC has been developed using a new SOI technology instead of conventional 500V Dielectric Isolation (DI) technology. In this new technology, 600V high voltage devices were materialized with a newly introduced po
Autor:
Yasushi Toyoda, Masashi Shinagawa, Katsunori Azuma, Katsuaki Saito, Tetsuo Oda, Yoshiaki Toyota, Mutsuhiro Mori, So Watanabe, Masatoshi Wakagi, Yuji Shima, Taiga Arai
Publikováno v:
2013 25th International Symposium on Power Semiconductor Devices & IC's (ISPSD).
Novel 3.3-kV trench IGBT with low loss and low dvAK/dt noise was developed. The structural feature of the IGBTs is deep p-WELL layers separated from trench gates. This structure suppresses excess VGE overshoot and then reduces recovery dvAK/dt. Moreo
Publikováno v:
Polymer Journal. 26:551-559
Synthesis and Properties of Aromatic Polyamides and Polyamide–Smectic Oligomer Graft Copolymer
Autor:
Mutsuhiro Mori, Katsuaki Saito, Kohsuke Ishibashi, Takashi Harada, Taiga Arai, Tetsuo Oda, Yasushi Toyoda, So Watanabe
Publikováno v:
2011 IEEE 23rd International Symposium on Power Semiconductor Devices and ICs.
A novel 1.7kV IGBT with deep floating-p layers separated from trench gates has been developed to realize low loss, low EMI noise, and high reliability. Separating floating-p layers from the trench gates reduces excess V GE overshoot, which results in