Výsledky vyhledávání - "Tesauro, M. R."

Periodical

Removal of hydrogen from 2H as Si(100) by sputtering and recoil implantation: investigation of an RPCVD growth mechanism

Autor: Tesauro, M. R., Underwood, G., Banerjee, S., Campion, A.

Publikováno v: Surface Science; 1998, Vol. 415 Issue: 1-2 p37-47, 11p

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Periodical

Temperature-programmed evolution of low-energy, rare-gas ions implanted in Si(100) [Surface Science 330 (1995) L633-L638]

Autor: Tesauro, M. R., Underwood, G., Kellerman, B. K., Campion, A.

Publikováno v: Surface Science; 1995, Vol. 340 Issue: 1 pL997-L997, 1p

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Periodical

Temperature-programmed evolution of low-energy, rare-gas ions implanted in Si(100)

Autor: Tesauro, M. R., Underwood, G., Kellerman, B. K., Campion, A.

Publikováno v: Surface Science; 1995, Vol. 330 Issue: 1 pL633-L633, 1p

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