Zobrazeno 1 - 10
of 38
pro vyhledávání: '"Teruhiko Kumada"'
Autor:
Takeo Ishibashi, Jianhai Jiang, Tetsuro Hanna, Yoko Takebe, Tomoharu Fujiwara, Teruhiko Kumada, Shinya Wakamizu, Takafumi Niwa, Osamu Yokokoji, Takuya Hagiwara, Mamoru Terai, Hideharu Kyouda
Publikováno v:
Journal of Photopolymer Science and Technology. 21:665-672
In this study, we focus on the controllability of a wafer bevel from adhesion and hydrophobicity viewpoints in order to solve the problems of film peeling and microdroplet formation around wafer bevels, which can result in pattern defects and degradi
Autor:
Naoki Man, Tetsuro Hanawa, Takuya Hagiwara, Yusuke Tanahashi, Kazuhiro Yoshikawa, Teruhiko Kumada, Mamoru Terai, Takeshi Matsunobu, Takeo Ishibashi, Osamu Yokokoji, Naoko Shirota
Publikováno v:
Journal of Photopolymer Science and Technology. 21:647-654
Non-topcoat (non-TC) resists, which blend hydrophobic additives into a resist polymer, have been proposed by vendors. To minimize the surface free energy, a hydrophobic additive segregates to the surface and forms a layer. The improvement of surface
Publikováno v:
Japanese Journal of Applied Physics. 45:5354-5358
We have newly developed a resolution enhancement lithography assisted by chemical shrink (RELACS) material for ArF lithography. Several process performances were evaluated for 65 nm nodes and next-generation devices. The principle and procedure of th
Autor:
Tomoyuki Ando, Tetsuro Hanawa, Mamoru Terai, Takeo Ishibashi, Teruhiko Kumada, Kazuyuki Suko, Shinroku Maejima, Koichiro Narimatsu, Tsohifumi Suganaga
Publikováno v:
Journal of Photopolymer Science and Technology. 19:547-554
This paper is intended as investigations of two interesting characteristics of ArF immersion lithography using topcoat (TC). On the one hand, we identified several hundreds gel-type defects over large areas of the unexposed top surface of the resist
Publikováno v:
Journal of Photopolymer Science and Technology. 14:519-522
Publikováno v:
Journal of Photopolymer Science and Technology. 13:391-394
Publikováno v:
KOBUNSHI RONBUNSHU. 55:231-242
Publikováno v:
Journal of Photopolymer Science and Technology. 10:609-612
Autor:
Teruhiko Kumada, Hideo Horibe
Publikováno v:
Electronics and Communications in Japan (Part II: Electronics). 80:36-45
Publikováno v:
KOBUNSHI RONBUNSHU. 53:133-141
ベース樹脂, 溶解抑制剤, および酸発生剤からなる化学増幅系3成分ポジ型レジストにおいて, 溶解抑制剤に着目し, レジスト未露光部の溶解速度の低下を図った. 同一示性式の溶解抑制剤 (