Zobrazeno 1 - 10
of 86
pro vyhledávání: '"Tengcai, Ma"'
Publikováno v:
In Surface & Coatings Technology 2007 201(15):6611-6614
Publikováno v:
In Vacuum 2002 65(3):347-352
Publikováno v:
In Vacuum 2002 65(3):353-359
Publikováno v:
Vacuum. 83:1376-1381
With three additional magnetic rings being assembled outside the discharge room and connected with the magnetic field of the conventional unbalanced magnetron sputtering, a closed magnetic field configuration distribution had been formed in the whole
Publikováno v:
Vacuum. 83:133-137
The removal of NOx from mixtures of NO–NO2–N2 and NO–NO2–O2–H2O is discussed theoretically in this study, and the removal of SO 2 and NO x is further discussed when a gas system of NOx–N2–O2–H2O contains CO2 and SO2. The involved chem
Autor:
Tengcai Ma, Ye Gong, Jinyuan Liu, Yujie Dai, Jianhong Zhang, Guobing Li, Xiaogang Wang, Yue Liu
Publikováno v:
Vacuum. 83:48-51
Based on a three-dimensional (3-D) code which instead of treating the full magnetohydrodynamic (MHD) equations directly, the effects of race-track and DRAKON (a Russian acronym for long equilibrium configuration) configurations on MHD equilibria and
Characteristics of ITO films fabricated on glass substrates by high intensity pulsed ion beam method
Publikováno v:
Journal of Non-Crystalline Solids. 353:2244-2249
Transparent conductive oxides such as indium tin oxide (ITO) are interesting materials due to their wide-band gaps, high visible light transmittance, high infrared reflectance, high electrical conductivity, hardness and chemical inertness. ITO films
Publikováno v:
Surface and Coatings Technology. 201:5072-5076
The structural and phase transformations occurring in the near-surface layers of pre-quenched W 6 Mo 5 Cr 4 V 2 high-speed steel (HSS) after intense pulsed ion beam (IPIB) irradiation, as well as their effect on the wear and corrosion resistance of i
Publikováno v:
Vacuum. 81:221-225
Optical emission spectroscopy has been performed for unbalanced DC magnetron sputtering of Cu in Ar atmosphere with the enhanced ionization of inductively coupled plasma. The intensities of Cu, Cu + , Ar and Ar + lines were measured at various discha
Properties and deposition processes of a-C: H films from CH4/Ar dielectric barrier discharge plasmas
Publikováno v:
Surface and Coatings Technology. 200:5819-5822
Hydrogenated amorphous carbon (a-C: H) films were deposited from CH 4+ Ar gas with low-pressure dielectric barrier discharge (DBD) plasmas. The deposition rate, film hardness and surface roughness were examined as a function of Ar concentration in CH