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pro vyhledávání: '"Teh-Tien Su"'
Autor:
Samantha Tan, Ted Ming-Lang Guo, Chan Lon Yang, Kai Ping Wang, Autumn Yeh, Chin Cheng Chien, Michael Chan, Teh-Tien Su, Alex Kabansky, Jack Kao, J.Y. Wu, Zhi Jian Wang
Publikováno v:
Solid State Phenomena. 195:79-81
Chemical and physical modifications of photoresist and BARC during plasma patterning process on HKMG structure can cause residual defects and yield loss that challenges the subsequent wet cleaning process to resolve this issue. The chemical behavior
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cb55c141e8394ab8d68c820a88601256
https://doi.org/10.4028/www.scientific.net/ssp.195.79
https://doi.org/10.4028/www.scientific.net/ssp.195.79
