Zobrazeno 1 - 10
of 58
pro vyhledávání: '"Teddie Magbitang"'
Publikováno v:
2022 21st IEEE Intersociety Conference on Thermal and Thermomechanical Phenomena in Electronic Systems (iTherm).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::da86cd020b633cd6b70ea3223bab711b
https://doi.org/10.1109/itherm54085.2022.9899557
https://doi.org/10.1109/itherm54085.2022.9899557
Autor:
Akihiro Horibe, Takahito Watanabe, Chinami Marushima, Hiroyuki Mori, Sayuri Kohara, Roy Yu, Marc Bergendahl, Teddie Magbitang, Rudy Wojtecki, Divya Taneja, Maxime Godard, Claudia Cristina Barrera Pulido, Isabel de Sousa, Kamal Sikka, Takashi Hisada
Publikováno v:
2022 IEEE 72nd Electronic Components and Technology Conference (ECTC).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f2f06610f02de551c38cd6ad101c6551
https://doi.org/10.1109/ectc51906.2022.00105
https://doi.org/10.1109/ectc51906.2022.00105
Autor:
Jonathan Ma, Rudy J. Wojtecki, Isvar A. Cordova, Krystelle Lionti, Teddie Magbitang, Alexander E. Hess, Gregory M. Wallraff, Eugene Delenia, Nicholas A. Lanzillo, Noah F. Fine Nathel, Holt Bui, Noel Arellano, Charles T. Rettner, Patrick P. Naulleau, Thomas G Pattison, Xiao Zhao
Publikováno v:
ACS Applied Materials & Interfaces. 13:9081-9090
The combination of area-selective deposition (ASD) with a patternable organic monolayer provides a versatile additive lithography platform, enabling the generation of a variety of nanoscale feature geometries. Stearate hydroxamic acid self-assembled
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::64b26c85a1d9d20cb16dd5d56a2ccbe4
https://doi.org/10.1021/acsami.0c16817
https://doi.org/10.1021/acsami.0c16817
Autor:
Daniel P. Sanders, Kristin Schmidt, Elizabeth Lofano, Gabriela Alva, Anindarupa Chunder, Ankit Vora, Jed W. Pitera, Teddie Magbitang, Joy Cheng, Noel Arellano, Leslie E. Thompson
Publikováno v:
ACS Applied Materials & Interfaces. 8:29808-29817
Orientation control of thin film nanostructures derived from block copolymers (BCPs) are of great interest for various emerging technologies like separation membranes, nanopatterning, and energy storage. While many BCP compositions have been develope
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::383b900b1e1d9c7d93730e04e9689dc6
https://doi.org/10.1021/acsami.6b11293
https://doi.org/10.1021/acsami.6b11293
Publikováno v:
Microporous and Mesoporous Materials. 226:221-228
Adsorption processes are ubiquitous in nature as well as of great technological importance for gas separation, purification, storage and thermally driven heat pumps. This has led to a strong interest in the fundamental mechanisms governing adsorption
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5a2916148556337b1fc8eb5a232ad838
https://doi.org/10.1016/j.micromeso.2015.12.029
https://doi.org/10.1016/j.micromeso.2015.12.029
Autor:
Daniel P. Sanders, Elizabeth Lofano, Anindarupa Chunder, Kristin Schmidt, Joy Cheng, Gabriela Alva, Noel Arellano, Teddie Magbitang, Ankit Vora
Publikováno v:
Journal of Photopolymer Science and Technology. 29:685-688
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::17efdde3c5ea976e0b5594d22067bef3
https://doi.org/10.2494/photopolymer.29.685
https://doi.org/10.2494/photopolymer.29.685
Autor:
Teddie Magbitang, Ankit Vora, Joy Cheng, Kristin Schmidt, Daniel P. Sanders, Khanh Nguyen, Melia Tjio, Noel Arellano, Anindarupa Chunder, Elizabeth Lofano
Publikováno v:
Journal of Photopolymer Science and Technology. 28:659-662
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d492e0ae64201bb1b3d74ecf36117232
https://doi.org/10.2494/photopolymer.28.659
https://doi.org/10.2494/photopolymer.28.659
Autor:
Krystelle Lionti, Teddie Magbitang, Martin Glodde, Anuja De Silva, Dario L. Goldfarb, Nelson Felix, Indira Sheshadri
Publikováno v:
SPIE Proceedings.
High resolution Extreme Ultraviolet (EUV) patterning is currently limited by EUV resist thickness and pattern collapse, thus impacting the faithful image transfer into the underlying stack. Such limitation requires the investigation of improved hardm
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c3720a8384ce7fe7f43e4a82ae2bd063
https://doi.org/10.1117/12.2257933
https://doi.org/10.1117/12.2257933
Publikováno v:
Scripta Materialia. 74:19-24
The fabrication of future interconnects in integrated circuits requires insulators with decreasing dielectric constants in order to maintain or improve the electrical performance of such devices. This is achieved through the introduction of air in th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ff593e44a73fa6255d3f71eb6669cadb
https://doi.org/10.1016/j.scriptamat.2013.05.025
https://doi.org/10.1016/j.scriptamat.2013.05.025
Autor:
Terry A. Spooner, Joe Lee, Alfred Grill, Huai Huang, Eric G. Liniger, B. Peethala, Willi Volksen, Hosadurga Shobha, Krystelle Lionti, Chao-Kun Hu, Griselda Bonilla, Theodorus E. Standaert, Donald F. Canaperi, Elbert E. Huang, Geraud Dubois, Teddie Magbitang, James Hsueh-Chung Chen, Daniel C. Edelstein
Publikováno v:
2016 IEEE International Interconnect Technology Conference / Advanced Metallization Conference (IITC/AMC).
Integration of high porosity low-k dielectrics faces major challenges as the porosity weakens the dielectric, resulting in severe plasma induced damage (PID) and difficulties in profile control. Post porosity plasma protection (P4) integration strate
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::98e08cd03f73c45a2f4d64a9c1a1e088
https://doi.org/10.1109/iitc-amc.2016.7507715
https://doi.org/10.1109/iitc-amc.2016.7507715