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pro vyhledávání: '"Technology war"'
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Autor:
Herbert Marcuse, Douglas Kellner
Herbert Marcuse is one of the most influential thinkers of our time. Born in Berlin, Marcuse studied philosophy with Husserl and Heidegger at the Universities of Freiburg and Berlin. Marcuse's critical social theory ingeniously fuses phenomenology, F
Publikováno v:
Brazilian Journal of Political Economy, Vol 43, Iss 1, Pp 5-25 (2023)
ABSTRACT This paper aims to analyze the evolution of the technology war between China and the USA in a context of exacerbation of techno-nationalist strategies for industrial and technological development. This analysis refers mainly to the Chinese s
Externí odkaz:
https://doaj.org/article/c9282f794eb14f3488fd30c7e213e1c1
Autor:
DIEGUES, ANTONIO CARLOS1 diegues@unicamp.br, ROSELINO, JOSÉ EDUARDO2 jeroselino@ufscar.br
Publikováno v:
Brazilian Journal of Political Economy / Revista de Economia Política. jan-mar2023, Vol. 43 Issue 1, p5-25. 21p.
Autor:
Andrew Collier
This book is a short history of the Chinese crackdown on the country's large technology firms that began in 2020. The book discusses the political and economic context, and outlines the limitations on the power of the state. As the policies of'common
Autor:
I. V. Danilin
Publikováno v:
Сравнительная политика, Vol 11, Iss 4, Pp 160-176 (2020)
US-China Technology War in 2019-2020 reached a new level. Washing ton introduced new measures aimed at preventing Chinese corporations from access to the emerging technologies, «smart» capital, and academic sector. For the PRC and Chinese technolog
Externí odkaz:
https://doaj.org/article/081d154615e9476b860e0f76ea8887ec
Autor:
Sagan, Scott D.
Publikováno v:
Daedalus, 2016 Oct 01. 145(4), 6-11.
Externí odkaz:
http://www.jstor.org/stable/24916779
Autor:
I. V. Danilin
Publikováno v:
Международная аналитика, Vol 11, Iss 4, Pp 21-38 (2021)
The paper examines the so-called U.S.-China “tech war” of 2017–2020 in the sphere of cutting-edge digital technologies, its origins, factors, and other aspects, with a focus on the American strategy to limit China’s opportunities for technolo
Externí odkaz:
https://doaj.org/article/dcd88e5a5bfb4cdd8dfc0ee05bfa8ee5
Autor:
Chin, Warren
Publikováno v:
International Affairs. Jul2019, Vol. 95 Issue 4, p765-783. 19p.